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Nitrogen and boron ion implantation into electrodeposited hard chrome

Conference ·
OSTI ID:419261
; ; ; ;  [1];  [2]
  1. Los Alamos National Lab., NM (United States)
  2. Norfolk State Univ., VA (United States). Center for Materials Research
Electrodeposited hard chrome was ion implanted with N alone, B alone, and a combination. Separate N and B implantation was done at 75 keV and incident doses of 2, 4, and 8x10{sup 17} at/cm{sup 2}. Samples with both N/B implants used 75 keV and incident dose levels of 4x10{sup 17} N- and B-at/cm{sup 2}. Beam-line system was used. Retained dose was measured using ion beam analysis, which indicated most of the incident dose was retained. Surface hardness, wear coefficient, and friction coefficient were determined by nanohardness indentation and pin-on-disk wear. At a depth of 50 nm, surface hardness increased from 18{+-}1 GPa (unimplanted) to a max of 23{+-}4 GPa for B implant and 26{+-}1 GPa for N implant. the wear coefficient was reduced by 1.3x to 7.4x, depending on implantation. N implant results in lower wear coefficients than B implant.
Research Organization:
Los Alamos National Lab., NM (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-36
OSTI ID:
419261
Report Number(s):
LA-UR--96-3244; CONF-9609259--1; ON: DE97000131
Country of Publication:
United States
Language:
English

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