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Title: Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}

Abstract

The LLNL Electron Beam Ion Trap (EBIT) has made low emittance beams of slow highly charged ions available for ion-solid interaction studies. Such interactions feature the dominance of electronic over collisional effects, and the shock waves generated by the ionized target atoms can desorb large numbers of large molecular species from the surface. This paper presents the first systematic study of the sputtering process due to the incidence of slow very highly charged ions; Th{sup 70+} ions are extracted from EBIT at 7 keV{sup *}q and directed onto thin SiO{sub 2} films on Si. Results suggest secondary ion yields of up to 25 per incident ion for Th{sup 70+} (secondary ion yield is increased over that for singly or moderately charged ions). Correlations of the negative, positive, and negative cluster ion yields show promise for application of highly charged ion induced sputtering for enhanced sensitivity and quantitative (absolute) SIMS analysis of deep submicron scale surface layers and polymeric and biomolecular material analysis.

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
201647
Report Number(s):
UCRL-JC-122147; CONF-9510323-1
ON: DE96004535; TRN: 96:008228
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: 10. international conference on secondary ion mass spectrometry and related techniques, Muenster (Germany), 1-6 Oct 1995; Other Information: PBD: 1 Oct 1995
Country of Publication:
United States
Language:
English
Subject:
66 PHYSICS; 40 CHEMISTRY; MULTICHARGED IONS; COLLISIONS; THORIUM IONS; SILICA; SPUTTERING; MASS SPECTROSCOPY; ION MICROPROBE ANALYSIS; HEAVY IONS; THIN FILMS; SECONDARY EMISSION; ION EMISSION

Citation Formats

Briere, M A, Schenkel, T, and Schneider, D. Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}. United States: N. p., 1995. Web.
Briere, M A, Schenkel, T, & Schneider, D. Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}. United States.
Briere, M A, Schenkel, T, and Schneider, D. Sun . "Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}". United States. https://www.osti.gov/servlets/purl/201647.
@article{osti_201647,
title = {Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}},
author = {Briere, M A and Schenkel, T and Schneider, D},
abstractNote = {The LLNL Electron Beam Ion Trap (EBIT) has made low emittance beams of slow highly charged ions available for ion-solid interaction studies. Such interactions feature the dominance of electronic over collisional effects, and the shock waves generated by the ionized target atoms can desorb large numbers of large molecular species from the surface. This paper presents the first systematic study of the sputtering process due to the incidence of slow very highly charged ions; Th{sup 70+} ions are extracted from EBIT at 7 keV{sup *}q and directed onto thin SiO{sub 2} films on Si. Results suggest secondary ion yields of up to 25 per incident ion for Th{sup 70+} (secondary ion yield is increased over that for singly or moderately charged ions). Correlations of the negative, positive, and negative cluster ion yields show promise for application of highly charged ion induced sputtering for enhanced sensitivity and quantitative (absolute) SIMS analysis of deep submicron scale surface layers and polymeric and biomolecular material analysis.},
doi = {},
url = {https://www.osti.gov/biblio/201647}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {10}
}

Conference:
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