Super TOF secondary ion mass spectroscopy using very highly charged primary ions up to Th{sup 70+}

Conference · Sun Oct 01 04:00:00 EDT 1995

OSTI ID:201647

Briere, M A; Schenkel, T; Schneider, D

The LLNL Electron Beam Ion Trap (EBIT) has made low emittance beams of slow highly charged ions available for ion-solid interaction studies. Such interactions feature the dominance of electronic over collisional effects, and the shock waves generated by the ionized target atoms can desorb large numbers of large molecular species from the surface. This paper presents the first systematic study of the sputtering process due to the incidence of slow very highly charged ions; Th{sup 70+} ions are extracted from EBIT at 7 keV{sup *}q and directed onto thin SiO{sub 2} films on Si. Results suggest secondary ion yields of up to 25 per incident ion for Th{sup 70+} (secondary ion yield is increased over that for singly or moderately charged ions). Correlations of the negative, positive, and negative cluster ion yields show promise for application of highly charged ion induced sputtering for enhanced sensitivity and quantitative (absolute) SIMS analysis of deep submicron scale surface layers and polymeric and biomolecular material analysis.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 201647
• Report Number(s): UCRL-JC--122147; CONF-9510323--1; ON: DE96004535
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
66 PHYSICS
COLLISIONS
HEAVY IONS
ION EMISSION
ION MICROPROBE ANALYSIS
MASS SPECTROSCOPY
MULTICHARGED IONS
SECONDARY EMISSION
SILICA
SPUTTERING
THIN FILMS
THORIUM IONS