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Title: Infrared light sources with semimetal electron injection

Patent ·
OSTI ID:20013882

An infrared light source is disclosed that comprises a layered semiconductor active region having a semimetal region and at least one quantum-well layer. The semimetal region, formed at an interface between a GaAsSb or GaInSb layer and an InAsSb layer, provides electrons and holes to the quantum-well layer to generate infrared light at a predetermined wavelength in the range of 2--6 {mu}m. Embodiments of the invention can be formed as electrically-activated light-emitting diodes (LEDs) or lasers, and as optically-pumped lasers. Since the active region is unipolar, multiple active regions can be stacked to form a broadband or multiple-wavelength infrared light source.

Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
20013882
Resource Relation:
Other Information: PBD: 30 Nov 1999
Country of Publication:
United States
Language:
English