Characterization of the surface to thiol bonding in self-assembled monolayer films of C{sub 12}H{sup 25}SH on InP(100) by angle-resolved x-ray photoelectron spectroscopy

Journal Article · Tue Dec 07 04:00:00 EST 1999 · Langmuir

DOI:https://doi.org/10.1021/la990467r· OSTI ID:20006407

Yamamoto, Hiromichi; Butera, R A; Gu, Y; Waldeck, D H

Angle-resolved X-ray photoelectron spectroscopy (ARXPS) was used to characterize the bonding of alkanethiols to n-InP surfaces and to measure the monolayer thickness. A careful comparison of the angle-dependent spectra for three different sample preparations (oxidized InP(100), HF-etched InP(100), and HF-etched InP(100) with a self-assembled monolayer of C{sub 12}H{sub 25}SH) shows that the sulfur binds to In atoms on the surface. Comparison of the angle-dependence of the intensity ratios for the In 3d{sub 5/2} core level of InP with the self-assembled monolayer (SAM) to that of sputtered InP provides a thickness for the SAM of 14 {+-} 4 {angstrom}, corresponding to alkane chains at a tilt angle of 44 {+-} 16{degree} from the surface normal.

• Research Organization: Univ. of Pittsburgh, PA (US)
• Sponsoring Organization: US Department of Energy
• DOE Contract Number: FG02-89ER14062
• OSTI ID: 20006407
• Journal Information: Langmuir, Journal Name: Langmuir Journal Issue: 25 Vol. 15; ISSN LANGD5; ISSN 0743-7463
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
36 MATERIALS SCIENCE
ALKANES
CHEMICAL BONDS
INDIUM PHOSPHIDE SOLAR CELLS
INDIUM PHOSPHIDES
THIOLS