Photopatterning of self-assembled alkanethiolate monolayers on gold. A simple monolayer photoresist utilizing aqueous chemistry
- Univ. of California, Irvine, CA (United States)
- Photometrics, Huntington Beach, CA (United States)
In this paper we demonstrate that self-assembled monolayers (SAMs) of alkanethiols on gold can be used as effective photoresists. UV photolysis of an alkanethiol SAM generates the corresponding sulfonate in the monolayer film. The sulfonate is easily rinsed off of the surface with water, exposing a clean gold substrate, which can then be modified with subsequent chemistry. We describe here experiments in which an alkanethiol SAM on a gold film on silicon is irradiated through a mask, followed by immersion of the sample in an aqueous acid etching solution (HCI:HNO[sub 3]:H[sub 2]O = 3:1:4). The gold is etched away from the areas which have been exposed to UV radiation leaving a pattern which reproduces the original mask. The spatial resolution in the present experiments is limited by the mask which is a 6-[mu]m wire grid. Scanning electron microscopy images of patterned samples show sharp edges to the features suggesting that spatial patterning on the 1-[mu]m scale should be attainable with this simple chemistry. 11 refs., 4 figs.
- OSTI ID:
- 7069298
- Journal Information:
- Langmuir; (United States), Journal Name: Langmuir; (United States) Vol. 10:3; ISSN LANGD5; ISSN 0743-7463
- Country of Publication:
- United States
- Language:
- English
Similar Records
Orthogonal self-assembled monolayers: Alkanethiols on gold and alkane carboxylic acids on alumina
Rapid Degradation of Alkanethiol-Based Self-Assembled Monolayers on Gold in Ambient Laboratory Conditions
Related Subjects
360101 -- Metals & Alloys-- Preparation & Fabrication
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102 -- Chemical & Spectral Procedures
400500* -- Photochemistry
CHEMICAL REACTIONS
CHLORINE COMPOUNDS
DECOMPOSITION
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ELEMENTS
ETCHING
FILMS
GOLD
HALOGEN COMPOUNDS
HYDROCHLORIC ACID
HYDROGEN COMPOUNDS
INORGANIC ACIDS
MASKING
MASS SPECTROSCOPY
METALS
MICROSCOPY
NITRIC ACID
ORGANIC COMPOUNDS
ORGANIC SULFUR COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
RADIATIONS
SCANNING ELECTRON MICROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
SULFONATES
SURFACE FINISHING
THIOLS
TRANSITION ELEMENTS
ULTRAVIOLET RADIATION