In situ atomic force microscopy imaging of electrodeposition of mixed layers of copper/cuprous oxide
In situ atomic force microscopy (AFM) was applied to the dynamic characterization of the growth of mixed Cu/Cu{sub 2}O layers obtained by galvanostatic electrodeposition from alkaline Cu(II) lactate solutions. The correlation of the cathode potential profile with the average topographic profiles computed from the AFM images provided evidence for two transitions in the deposit growth during which the average growth velocity underwent rapid accelerations, the first one corresponding to zero interfacial concentration (Sand's time) and the second one to the emergence of the oscillations by a smooth transition. Despite its temporal resolution, the AFM technique could not capture the details of a single oscillation, but it proved to be quite adequate for tracking the general evolution of the electrode surface.
- Research Organization:
- Centre de Recherche Paul Pascal, Pessac (FR)
- Sponsoring Organization:
- US Department of Energy
- OSTI ID:
- 20003946
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 11 Vol. 146; ISSN 0013-4651; ISSN JESOAN
- Country of Publication:
- United States
- Language:
- English
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In situ atomic force microscopy imaging of electrodeposition of mixed layers of copper/cuprous oxide