Electrodeposition of copper/cuprous oxide nanocomposites
- Univ. of Missouri, MO (United States)
Copper and cuprous oxide can both be electrodeposited from an alkaline solution of a lactate complex of Cu(II). At low applied potentials or currents, pure cuprous oxide is deposited. It is a p-type semiconductor with a bandgap of 1.9 eV (indirect) and a resistivity in the Mohm-cm range. As the potential is driven more negative of about -0.6V vs SCE, a strained nanocomposite of copper and cuprous oxide is deposited. The potential oscillates during galvanostatic deposition, suggesting that the nanocomposites are actually self-assembled multilayers with layers as thin as 10 nm. We expect these materials to have interesting optical and electrical properties, since the films consist of thousands of stacked Schottky barriers.
- OSTI ID:
- 370127
- Report Number(s):
- CONF-960376--
- Country of Publication:
- United States
- Language:
- English
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