Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal

Huber, Wolfgang; Houlahan, Thomas; Jeckell, Zachary; Barlaz, David; Haehnlein, Ian; Jurczyk, Brian; Ruzic, David N.

doi:10.1088/1361-6595/ac6d0a

Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal

Journal Article · Wed Jun 01 04:00:00 EDT 2022 · Plasma Sources Science and Technology

DOI:https://doi.org/10.1088/1361-6595/ac6d0a· OSTI ID:1979316

Huber, Wolfgang ^[1]; Houlahan, Thomas; Jeckell, Zachary; ; Haehnlein, Ian; Jurczyk, Brian;

OSTI

Abstract

The time-dependent plasma properties of a high-power impulse magnetron sputtering plasma are investigated which include a positive ‘kick’ pulse on the sputtering target 2μs after the main negative pulse, this reversing the voltage on the cathode. At a substrate 15 cm distant from the magnetron, the time-dependent electron energy distribution function (EEDF), plasma potential, potential commute time and plasma diffusion properties are measured using a single Langmuir probe. Results show that the positive pulse on the target expels plasma and raises the plasma potential across the chamber on the order of 1 to 2μs, which is the time scale of the electron diffusion. The EEDF at the substrate fits a Druyvesteyn distribution during the main negative pulse rising slightly in average energy over time. The distribution is still Druyvesteyn and at the very start of the positive pulse, but then loses the higher energy electrons and drops in average electron energy as the positive pulse progresses. A Boltzmann equation solver, BOLSIG+, was used to predict the EEDF at the substrate during the positive pulse and it agrees best with the measurements assuming a value of 0.2 Td for theE/N(electric field/gas number density).

Research Organization:: Starfire Industries, LLC, Champaign, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: SC0020689

OSTI ID:: 1979316

Journal Information:: Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Journal Issue: 6 Vol. 31; ISSN 0963-0252

Publisher:: IOP Publishing

Country of Publication:: United States

Language:: English

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