Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target

Zheng, Bocong; Fu, Yangyang; Wang, Keliang; Schuelke, Thomas; Fan, Qi Hua

doi:10.1088/1361-6595/abe9f9

Title: Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target

Journal Article · Mon Mar 01 00:00:00 EST 2021 · Plasma Sources Science and Technology

DOI:https://doi.org/10.1088/1361-6595/abe9f9· OSTI ID:1850776

;

; Wang, Keliang;

;

Abstract We demonstrate a self-consistent and complete description of electron dynamics in a typical electropositive radio frequency magnetron sputtering (RFMS) argon discharge with a dielectric target. The electron dynamics, including the electron power absorption dynamics in one radio frequency (RF) period, is studied via a fully kinetic 2d3v particle-in-cell/Monte Carlo collision (PIC/MCC) electrostatic simulation. The interplay between the fundamental plasma parameters is analyzed through their spatiotemporal dynamics. Due to the influence of magnetic trap on the electron transport, a spatially dependent charging that perturbs the electric potential is observed on the dielectric target surface, resulting in a spatially dependent ion energy distribution along the target surface. TheE×Bdrift-to-discharge current ratio is in approximate agreement with Bohm diffusion. The electron power absorption can be primarily decoupled into the positive Ohmic power absorption in the bulk plasma region and the negative pressure-induced power absorption near the target surface. Ohmic power absorption is the dominant electron power absorption mechanism, mostly contributed by the azimuthal electron current. The power absorption due to electron inertial effects is negligible on time-average. Both the maximum power absorption and dissipation of electrons appear in the bulk plasma region during the second half of the RF period, implying a strong electron trapping in magnetron discharges. The contribution of secondary electrons is negligible under typical RFMS discharge conditions.

Cite

Export

Save

Research Organization:: Univ. of Michigan, Ann Arbor, MI (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: SC0001939

OSTI ID:: 1850776

Journal Information:: Plasma Sources Science and Technology, Vol. 30, Issue 3; ISSN 0963-0252

Publisher:: IOP Publishing

Country of Publication:: United States

Language:: English

References (134)

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) Anders, André Journal of Applied Physics, Vol. 121, Issue 17 https://doi.org/10.1063/1.4978350	journal	March 2017
Physics and technology of magnetron sputtering discharges Gudmundsson, J. T. Plasma Sources Science and Technology, Vol. 29, Issue 11 https://doi.org/10.1088/1361-6595/abb7bd	journal	November 2020
Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering Kim, Kun Ho; Park, Ki Cheol; Ma, Dae Young Journal of Applied Physics, Vol. 81, Issue 12 https://doi.org/10.1063/1.365556	journal	June 1997
The grain size effects on the photoluminescence of ZnO/α-Al2O3 grown by radio-frequency magnetron sputtering Kim, Kyoung-Kook; Song, Jae-Hoon; Jung, Hyung-Jin Journal of Applied Physics, Vol. 87, Issue 7 https://doi.org/10.1063/1.372383	journal	April 2000
Enhancement of the light emissions from zinc oxide films by controlling the post-treatment ambient Shi, W. S.; Agyeman, O.; Xu, C. N. Journal of Applied Physics, Vol. 91, Issue 9 https://doi.org/10.1063/1.1466527	journal	May 2002
Photoluminescence dependence of ZnO films grown on Si(100) by radio-frequency magnetron sputtering on the growth ambient Jeong, Sang-Hun; Kim, Bong-Soo; Lee, Byung-Teak Applied Physics Letters, Vol. 82, Issue 16 https://doi.org/10.1063/1.1568543	journal	April 2003
Hydrogen-doped high conductivity ZnO films deposited by radio-frequency magnetron sputtering Chen, Liang-Yih; Chen, Wen-Hwa; Wang, Jia-Jun Applied Physics Letters, Vol. 85, Issue 23 https://doi.org/10.1063/1.1835991	journal	December 2004
Properties of nitrogen-implanted p -type ZnO films grown on Si3N4/Si by radio-frequency magnetron sputtering Lin, Chin-Ching; Chen, San-Yuan; Cheng, Syh-Yuh Applied Physics Letters, Vol. 84, Issue 24 https://doi.org/10.1063/1.1763640	journal	June 2004
Study of the photoluminescence of phosphorus-doped p-type ZnO thin films grown by radio-frequency magnetron sputtering Hwang, Dae-Kue; Kim, Hyun-Sik; Lim, Jae-Hong Applied Physics Letters, Vol. 86, Issue 15 https://doi.org/10.1063/1.1895480	journal	April 2005
Unipolar resistive switching characteristics of ZnO thin films for nonvolatile memory applications Chang, Wen-Yuan; Lai, Yen-Chao; Wu, Tai-Bor Applied Physics Letters, Vol. 92, Issue 2 https://doi.org/10.1063/1.2834852	journal	January 2008
Plasma synthesis of photocatalytic TiO _x thin films Sirghi, L. Plasma Sources Science and Technology, Vol. 25, Issue 3 https://doi.org/10.1088/0963-0252/25/3/033003	journal	May 2016
Piezoelectric BaTiO ₃ Thin Film Nanogenerator on Plastic Substrates Park, Kwi-Il; Xu, Sheng; Liu, Ying Nano Letters, Vol. 10, Issue 12 https://doi.org/10.1021/nl102959k	journal	December 2010
Low-temperature-processed efficient semi-transparent planar perovskite solar cells for bifacial and tandem applications Fu, Fan; Feurer, Thomas; Jäger, Timo Nature Communications, Vol. 6, Issue 1 https://doi.org/10.1038/ncomms9932	journal	November 2015
Preparation of (100)‐oriented metallic LaNiO ₃ thin films on Si substrates by radio frequency magnetron sputtering for the growth of textured Pb(Zr _0.53 Ti _0.47 )O ₃ Yang, Ching‐Chyuan; Chen, Ming‐Sen; Hong, Tian‐Jue Applied Physics Letters, Vol. 66, Issue 20 https://doi.org/10.1063/1.113111	journal	May 1995
Ferroelectric and electrical behavior of (Na0.5Bi0.5)TiO3 thin films Zhou, Z. H.; Xue, J. M.; Li, W. Z. Applied Physics Letters, Vol. 85, Issue 5 https://doi.org/10.1063/1.1771808	journal	August 2004
BiFeO3 thin films of (111)-orientation deposited on SrRuO3 buffered Pt/TiO2/SiO2/Si(100) substrates Wu, Jiagang; Wang, John Acta Materialia, Vol. 58, Issue 5 https://doi.org/10.1016/j.actamat.2009.11.011	journal	March 2010
Microstructural, electrical, and optical properties of SnO2 nanocrystalline thin films grown on InP (100) substrates for applications as gas sensor devices Kim, T. W.; Lee, D. U.; Yoon, Y. S. Journal of Applied Physics, Vol. 88, Issue 6 https://doi.org/10.1063/1.1288021	journal	September 2000
Nanostructured WO3 thin film as a new anode material for lithium-ion batteries Li, Wen-Jing; Fu, Zheng-Wen Applied Surface Science, Vol. 256, Issue 8 https://doi.org/10.1016/j.apsusc.2009.10.085	journal	February 2010
Effect of oxygen to argon ratio on properties of (Ba,Sr)TiO3 thin films prepared by radio-frequency magnetron sputtering Tsai, M. S.; Sun, S. C.; Tseng, T. Y. Journal of Applied Physics, Vol. 82, Issue 7 https://doi.org/10.1063/1.365665	journal	October 1997
Preparation and characterization of AlCrTaTiZr multi-element nitride coatings Lai, Chia-Han; Lin, Su-Jien; Yeh, Jien-Wei Surface and Coatings Technology, Vol. 201, Issue 6 https://doi.org/10.1016/j.surfcoat.2006.06.048	journal	December 2006
Microstructure and mechanical properties of hydroxyapatite thin films grown by RF magnetron sputtering Nelea, V.; Morosanu, C.; Iliescu, M. Surface and Coatings Technology, Vol. 173, Issue 2-3 https://doi.org/10.1016/s0257-8972(03)00729-1	journal	August 2003
Hydroxyapatite thin films grown by pulsed laser deposition and radio-frequency magnetron sputtering: comparative study Nelea, V.; Morosanu, C.; Iliescu, M. Applied Surface Science, Vol. 228, Issue 1-4 https://doi.org/10.1016/j.apsusc.2004.01.029	journal	April 2004
Influence of the substrate on growth and magnetoresistance of La0.7Ca0.3MnOz thin films deposited by magnetron sputtering Vlakhov, E. S.; Chakalov, R. A.; Chakalova, R. I. Journal of Applied Physics, Vol. 83, Issue 4 https://doi.org/10.1063/1.366952	journal	February 1998
A structure zone diagram including plasma-based deposition and ion etching Anders, André Thin Solid Films, Vol. 518, Issue 15 https://doi.org/10.1016/j.tsf.2009.10.145	journal	May 2010
Effects of phase regulation on ion energy distribution in RF bias sputtering Tsuda, Osamu; Tatebayashi, Yoshinao; Takamura, Yukiko Yamada Plasma Sources Science and Technology, Vol. 8, Issue 3 https://doi.org/10.1088/0963-0252/8/3/308	journal	January 1999
Ion energy distribution measurements in rf and pulsed dc plasma discharges Gahan, D.; Daniels, S.; Hayden, C. Plasma Sources Science and Technology, Vol. 21, Issue 2 https://doi.org/10.1088/0963-0252/21/2/024004	journal	April 2012
Energy fluxes in a radio-frequency magnetron discharge for the deposition of superhard cubic boron nitride coatings Bornholdt, S.; Ye, J.; Ulrich, S. Journal of Applied Physics, Vol. 112, Issue 12 https://doi.org/10.1063/1.4769800	journal	December 2012
Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films Bornholdt, S.; Itagaki, N.; Kuwahara, K. Plasma Sources Science and Technology, Vol. 22, Issue 2 https://doi.org/10.1088/0963-0252/22/2/025019	journal	April 2013
Ion energy control via the electrical asymmetry effect to tune coating properties in reactive radio frequency sputtering Ries, Stefan; Banko, Lars; Hans, Marcus Plasma Sources Science and Technology, Vol. 28, Issue 11 https://doi.org/10.1088/1361-6595/ab504b	journal	November 2019
Steady‐state rf magnetron discharges I., Lin Journal of Applied Physics, Vol. 58, Issue 8 https://doi.org/10.1063/1.335847	journal	October 1985
Spatial structure of electrons and fluorine atoms in a RF magnetron plasma Ohtsu, Yasunori; Matsuo, Hitoshi; Fujita, Hiroharu Plasma Sources Science and Technology, Vol. 5, Issue 2 https://doi.org/10.1088/0963-0252/5/2/034	journal	May 1996
Plasma-density control in the magnetron-type RF plasma Li, Yunlong; Iizuka, Satoru; Sato, Noriyoshi Plasma Sources Science and Technology, Vol. 5, Issue 2 https://doi.org/10.1088/0963-0252/5/2/017	journal	May 1996
Effect of driving frequency on plasma property in radio frequency and very high frequency magnetron sputtering discharges Huang, Fupei; Ye, Chao; He, Haijie Plasma Sources Science and Technology, Vol. 23, Issue 1 https://doi.org/10.1088/0963-0252/23/1/015003	journal	December 2013
Experimental investigations of the magnetic asymmetry effect in capacitively coupled radio frequency plasmas Oberberg, M.; Kallähn, J.; Awakowicz, P. Plasma Sources Science and Technology, Vol. 27, Issue 10 https://doi.org/10.1088/1361-6595/aae199	journal	October 2018
Magnetic control of nonlinear electron resonance heating in a capacitively coupled radio frequency discharge Oberberg, M.; Engel, D.; Berger, B. Plasma Sources Science and Technology, Vol. 28, Issue 11 https://doi.org/10.1088/1361-6595/ab53a0	journal	November 2019
The magnetic asymmetry effect in geometrically asymmetric capacitively coupled radio frequency discharges operated in Ar/O ₂ Oberberg, M.; Berger, B.; Buschheuer, M. Plasma Sources Science and Technology, Vol. 29, Issue 7 https://doi.org/10.1088/1361-6595/ab9b31	journal	July 2020
Model of magnetically enhanced, capacitive RF discharges Lieberman, M. A.; Lichtenberg, A. J.; Savas, S. E. IEEE Transactions on Plasma Science, Vol. 19, Issue 2 https://doi.org/10.1109/27.106813	journal	April 1991
Simple model of power deposited into the plasma bulk of rf planar magnetrons Minea, T. M.; Bretagne, J. Plasma Sources Science and Technology, Vol. 12, Issue 1 https://doi.org/10.1088/0963-0252/12/1/313	journal	January 2003
An ionization region model for high-power impulse magnetron sputtering discharges Raadu, M. A.; Axnäs, I.; Gudmundsson, J. T. Plasma Sources Science and Technology, Vol. 20, Issue 6 https://doi.org/10.1088/0963-0252/20/6/065007	journal	November 2011
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses Huo, Chunqing; Raadu, Michael A.; Lundin, Daniel Plasma Sources Science and Technology, Vol. 21, Issue 4 https://doi.org/10.1088/0963-0252/21/4/045004	journal	June 2012
On sheath energization and Ohmic heating in sputtering magnetrons Huo, Chunqing; Lundin, Daniel; Raadu, Michael A. Plasma Sources Science and Technology, Vol. 22, Issue 4 https://doi.org/10.1088/0963-0252/22/4/045005	journal	June 2013
On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics Huo, Chunqing; Lundin, Daniel; Raadu, Michael A. Plasma Sources Science and Technology, Vol. 23, Issue 2 https://doi.org/10.1088/0963-0252/23/2/025017	journal	April 2014
On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments Zheng, B. C.; Meng, D.; Che, H. L. Journal of Applied Physics, Vol. 117, Issue 20 https://doi.org/10.1063/1.4921443	journal	May 2015
The role of Ohmic heating in dc magnetron sputtering Brenning, N.; Gudmundsson, J. T.; Lundin, D. Plasma Sources Science and Technology, Vol. 25, Issue 6 https://doi.org/10.1088/0963-0252/25/6/065024	journal	November 2016
Particle-balance models for pulsed sputtering magnetrons Huo, Chunqing; Lundin, D.; Gudmundsson, J. T. Journal of Physics D: Applied Physics, Vol. 50, Issue 35 https://doi.org/10.1088/1361-6463/aa7d35	journal	August 2017
A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges Zheng, B. C.; Wu, Z. L.; Wu, B. Journal of Applied Physics, Vol. 121, Issue 17 https://doi.org/10.1063/1.4977471	journal	May 2017
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons Brenning, N.; Gudmundsson, J. T.; Raadu, M. A. Plasma Sources Science and Technology, Vol. 26, Issue 12 https://doi.org/10.1088/1361-6595/aa959b	journal	November 2017
A study of the oxygen dynamics in a reactive Ar/O ₂ high power impulse magnetron sputtering discharge using an ionization region model Lundin, D.; Gudmundsson, J. T.; Brenning, N. Journal of Applied Physics, Vol. 121, Issue 17 https://doi.org/10.1063/1.4977817	journal	May 2017
Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials Zheng, Bocong; Wu, Zhongzhen; Cui, Suihan IEEE Transactions on Plasma Science, Vol. 47, Issue 1 https://doi.org/10.1109/tps.2018.2884475	journal	January 2019
Hollow cathode effect modified time-dependent global model and high-power impulse magnetron sputtering discharge and transport in cylindrical cathode Cui, Suihan; Wu, Zhongzhen; Lin, Hai Journal of Applied Physics, Vol. 125, Issue 6 https://doi.org/10.1063/1.5048554	journal	February 2019
Nano-second temporal particle behavior in high-power impulse magnetron sputtering discharge in a cylindrical cathode Cui, Suihan; Wu, Zhongzhen; Xiao, Shu Journal of Applied Physics, Vol. 127, Issue 2 https://doi.org/10.1063/1.5127565	journal	January 2020
Modeling and plasma characteristics of high-power direct current discharge Chen, Lei; Cui, Suihan; Tang, Wei Plasma Sources Science and Technology, Vol. 29, Issue 2 https://doi.org/10.1088/1361-6595/ab681c	journal	February 2020
Populations of metastable and resonant argon atoms in radio frequency magnetron plasmas used for deposition of indium-zinc-oxide films Maaloul, L.; Morel, S.; Stafford, L. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 2 https://doi.org/10.1116/1.3674162	journal	March 2012
Modeling of magnetically enhanced capacitively coupled plasma sources: Ar discharges Kushner, Mark J. Journal of Applied Physics, Vol. 94, Issue 3 https://doi.org/10.1063/1.1587887	journal	August 2003
Simulations of magnetized capacitively coupled plasmas operating at constant power and voltage Rauf, Shahid Plasma Sources Science and Technology, Vol. 14, Issue 2 https://doi.org/10.1088/0963-0252/14/2/015	journal	April 2005
Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges Yang, Yang; Kushner, Mark J. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 25, Issue 5 https://doi.org/10.1116/1.2771558	journal	January 2007
Characterization of an Ar/O ₂ magnetron plasma by a multi-species Monte Carlo model Bultinck, E.; Bogaerts, A. Plasma Sources Science and Technology, Vol. 20, Issue 4 https://doi.org/10.1088/0963-0252/20/4/045013	journal	June 2011
Computer modelling of magnetron discharges Bogaerts, Annemie; Bultinck, Evi; Kolev, Ivan Journal of Physics D: Applied Physics, Vol. 42, Issue 19 https://doi.org/10.1088/0022-3727/42/19/194018	journal	September 2009
Evolution of the two-dimensional axisymmetric charged particle density in a radio frequency planar magnetron via a PIC-MCC simulation Minea, T. M.; Bretagne, J.; Gousset, G. IEEE Transactions on Plasma Science, Vol. 27, Issue 1 https://doi.org/10.1109/27.763060	journal	January 1999
PIC-MCC simulation of a r.f. planar magnetron discharge and comparison with experiment Minea, T. M.; Bretagne, J.; Gousset, G. Surface and Coatings Technology, Vol. 116-119 https://doi.org/10.1016/s0257-8972(99)00187-5	journal	September 1999
Electrical characterization of an rf planar magnetron in inert gases Minea, T. M.; Bretagne, J.; Pagnon, D. Journal of Physics D: Applied Physics, Vol. 33, Issue 15 https://doi.org/10.1088/0022-3727/33/15/319	journal	July 2000
Axisymmetrical particle-in-cell/Monte Carlo simulation of narrow gap planar magnetron plasmas. II. Radio frequency-driven discharge Kondo, Shuji; Nanbu, Kenichi Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 19, Issue 3 https://doi.org/10.1116/1.1359535	journal	May 2001
Fundamental aspects in non-reactive and reactive magnetron discharges Bretagne, J.; Laporte, C. Boisse; Gousset, G. Plasma Sources Science and Technology, Vol. 12, Issue 4 https://doi.org/10.1088/0963-0252/12/4/318	journal	September 2003
Self-consistent particle-in-cell/Monte Carlo simulation of RF magnetron discharges of oxygen/argon mixture: effects of partial pressure ratio Yonemura, S.; Nanbu, K. IEEE Transactions on Plasma Science, Vol. 31, Issue 4 https://doi.org/10.1109/tps.2003.815466	journal	August 2003
Increase of Ar/sup +/ ion density in argon RF magnetron discharges caused by the addition of a small amount of oxygen Yonemura, S.; Nanbu, K. IEEE Transactions on Plasma Science, Vol. 33, Issue 2 https://doi.org/10.1109/tps.2005.845067	journal	April 2005
Dc self-bias voltages in radio frequency magnetron discharges Yonemura, S.; Nanbu, K. Thin Solid Films, Vol. 506-507 https://doi.org/10.1016/j.tsf.2005.08.111	journal	May 2006
Effects of Increasing Magnetic Field and Decreasing Pressure on Asymmetric Magnetron Radio Frequency ${\rm Ar}/{\rm O}_{2}$ Discharges Benyoucef, Djilali; Yousfi, Mohammed IEEE Transactions on Plasma Science, Vol. 41, Issue 4 https://doi.org/10.1109/tps.2013.2250312	journal	April 2013
Particle modelling of low-pressure radio-frequency magnetron discharges including the effects of self-induced electromagnetic fields Benyoucef, D.; Yousfi, M. Plasma Sources Science and Technology, Vol. 23, Issue 4 https://doi.org/10.1088/0963-0252/23/4/044007	journal	July 2014
Electron dynamics in low pressure capacitively coupled radio frequency discharges Wilczek, S.; Schulze, J.; Brinkmann, R. P. Journal of Applied Physics, Vol. 127, Issue 18 https://doi.org/10.1063/5.0003114	journal	May 2020
From Fermi acceleration to collisionless discharge heating Lieberman, M. A.; Godyak, V. A. IEEE Transactions on Plasma Science, Vol. 26, Issue 3 https://doi.org/10.1109/27.700878	journal	June 1998
Driving frequency effect on electron heating mode transition in capacitive discharge You, S. J.; Ahn, S. K.; Chang, H. Y. Applied Physics Letters, Vol. 89, Issue 17 https://doi.org/10.1063/1.2348739	journal	October 2006
Nonlinear electron resonance heating in capacitive radio frequency discharges Mussenbrock, Thomas; Brinkmann, Ralf Peter Applied Physics Letters, Vol. 88, Issue 15 https://doi.org/10.1063/1.2194824	journal	April 2006
Collisionless heating in radio-frequency discharges: a review Turner, M. M. Journal of Physics D: Applied Physics, Vol. 42, Issue 19 https://doi.org/10.1088/0022-3727/42/19/194008	journal	September 2009
Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments Donkó, Z.; Schulze, J.; Czarnetzki, U. Plasma Physics and Controlled Fusion, Vol. 54, Issue 12 https://doi.org/10.1088/0741-3335/54/12/124003	journal	November 2012
Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring Lafleur, T.; Delattre, P. A.; Johnson, E. V. Applied Physics Letters, Vol. 101, Issue 12 https://doi.org/10.1063/1.4754692	journal	September 2012
Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms Lafleur, T.; Boswell, R. W.; Booth, J. P. Applied Physics Letters, Vol. 100, Issue 19 https://doi.org/10.1063/1.4712128	journal	May 2012
Particle-in-cell simulations of hollow cathode enhanced capacitively coupled radio frequency discharges Lafleur, T.; Boswell, R. W. Physics of Plasmas, Vol. 19, Issue 2 https://doi.org/10.1063/1.3685709	journal	February 2012
“Anomalous” collisionality in low-pressure plasmas Lafleur, T.; Chabert, P.; Turner, M. M. Physics of Plasmas, Vol. 20, Issue 12 https://doi.org/10.1063/1.4859155	journal	December 2013
The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas Schulze, J.; Donkó, Z.; Derzsi, A. Plasma Sources Science and Technology, Vol. 24, Issue 1 https://doi.org/10.1088/0963-0252/24/1/015019	journal	December 2014
Equivalence of the hard-wall and kinetic-fluid models of collisionless electron heating in capacitively coupled discharges Lafleur, T.; Chabert, P.; Turner, M. M. Plasma Sources Science and Technology, Vol. 23, Issue 1 https://doi.org/10.1088/0963-0252/23/1/015016	journal	February 2014
Electron heating in capacitively coupled plasmas revisited Lafleur, T.; Chabert, P.; Booth, J. P. Plasma Sources Science and Technology, Vol. 23, Issue 3 https://doi.org/10.1088/0963-0252/23/3/035010	journal	May 2014
Is collisionless heating in capacitively coupled plasmas really collisionless? Lafleur, T.; Chabert, P. Plasma Sources Science and Technology, Vol. 24, Issue 4 https://doi.org/10.1088/0963-0252/24/4/044002	journal	June 2015
Electron heating in capacitively coupled RF plasmas: a unified scenario Peter Brinkmann, Ralf Plasma Sources Science and Technology, Vol. 25, Issue 1 https://doi.org/10.1088/0963-0252/25/1/014001	journal	December 2015
Electron heating in technological plasmas Schulze, Julian; Mussenbrock, Thomas Plasma Sources Science and Technology, Vol. 25, Issue 2 https://doi.org/10.1088/0963-0252/25/2/020401	journal	February 2016
On electron heating in a low pressure capacitively coupled oxygen discharge Gudmundsson, J. T.; Snorrason, D. I. Journal of Applied Physics, Vol. 122, Issue 19 https://doi.org/10.1063/1.5003971	journal	November 2017
The frequency dependence of the discharge properties in a capacitively coupled oxygen discharge Gudmundsson, J. T.; Snorrason, D. I.; Hannesdottir, H. Plasma Sources Science and Technology, Vol. 27, Issue 2 https://doi.org/10.1088/1361-6595/aaa880	journal	February 2018
Spatio-temporal analysis of the electron power absorption in electropositive capacitive RF plasmas based on moments of the Boltzmann equation Schulze, J.; Donkó, Z.; Lafleur, T. Plasma Sources Science and Technology, Vol. 27, Issue 5 https://doi.org/10.1088/1361-6595/aabebc	journal	May 2018
On uniformity and non-local transport in low pressure capacitively coupled plasmas Rauf, Shahid Plasma Sources Science and Technology, Vol. 29, Issue 9 https://doi.org/10.1088/1361-6595/abac4a	journal	September 2020
Reactor modeling of magnetically enhanced capacitive RF discharge IEEE Transactions on Plasma Science, Vol. 25, Issue 3 https://doi.org/10.1109/27.597265	journal	June 1997
Power dissipation mode transition by a magnetic field You, S. J.; Chung, C. W.; Bai, K. H. Applied Physics Letters, Vol. 81, Issue 14 https://doi.org/10.1063/1.1506944	journal	September 2002
Electron and ion kinetics in magnetized capacitively coupled plasma source Lee, S. H.; You, S. J.; Chang, H. Y. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 25, Issue 3 https://doi.org/10.1116/1.2713408	journal	May 2007
Evolution of electron temperature in low pressure magnetized capacitive plasma You, S. J.; Park, G. Y.; Kwon, J. H. Applied Physics Letters, Vol. 96, Issue 10 https://doi.org/10.1063/1.3309589	journal	March 2010
Role of transverse magnetic field in the capacitive discharge You, S. J.; Hai, T. T.; Park, M. Thin Solid Films, Vol. 519, Issue 20 https://doi.org/10.1016/j.tsf.2011.01.384	journal	August 2011
Sustaining mechanism and spatial structure of high-density ring-shaped hollow cuspate magnetized rf plasma for low-pressure plasma processing Ohtsu, Y.; Yanagise, T. Plasma Sources Science and Technology, Vol. 24, Issue 3 https://doi.org/10.1088/0963-0252/24/3/034005	journal	May 2015
Heating mechanisms for electron swarms in radio-frequency electric and magnetic fields Dujko, S.; Bošnjaković, D.; White, R. D. Plasma Sources Science and Technology, Vol. 24, Issue 5 https://doi.org/10.1088/0963-0252/24/5/054006	journal	September 2015
Heating mechanisms of magnetized capacitively coupled argon plasmas excited by tailored voltage waveforms Yang, Shali; Innocenti, Maria Elena; Zhang, Ya Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 6 https://doi.org/10.1116/1.4990137	journal	November 2017
Passive inference of collision frequency in magnetized capacitive argon discharge Binwal, S.; Joshi, J. K.; Karkari, S. K. Physics of Plasmas, Vol. 25, Issue 3 https://doi.org/10.1063/1.5001972	journal	March 2018
Enhancement of Ohmic heating by Hall current in magnetized capacitively coupled discharges Zheng, Bocong; Wang, Keliang; Grotjohn, Timothy Plasma Sources Science and Technology, Vol. 28, Issue 9 https://doi.org/10.1088/1361-6595/ab419d	journal	September 2019
Electron power absorption dynamics in magnetized capacitively coupled radio frequency oxygen discharges Wang, Li; Wen, De-Qi; Hartmann, Peter Plasma Sources Science and Technology, Vol. 29, Issue 10 https://doi.org/10.1088/1361-6595/abb2e7	journal	October 2020
The effects of a small transverse magnetic field upon a capacitively coupled RF discharge Hutchinson, D. A. W.; Turner, M. M.; Doyle, R. A. IEEE Transactions on Plasma Science, Vol. 23, Issue 4 https://doi.org/10.1109/27.467985	journal	January 1995
Spherical shell model of an asymmetric rf discharge Lieberman, M. A. Journal of Applied Physics, Vol. 65, Issue 11 https://doi.org/10.1063/1.343298	journal	June 1989
Bias voltage in finite length, cylindrical and coaxial radio‐frequency discharges Lieberman, M. A.; Savas, S. E. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 3 https://doi.org/10.1116/1.576778	journal	May 1990
Application of RF Discharges to Sputtering Koenig, H. R.; Maissel, L. I. IBM Journal of Research and Development, Vol. 14, Issue 2 https://doi.org/10.1147/rd.142.0168	journal	March 1970
Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygen Proto, A.; Gudmundsson, J. T. Journal of Applied Physics, Vol. 128, Issue 11 https://doi.org/10.1063/5.0019340	journal	September 2020
Plasma non-uniformity in a symmetric radiofrequency capacitively-coupled reactor with dielectric side-wall: a two dimensional particle-in-cell/Monte Carlo collision simulation Liu, Yue; Booth, Jean-Paul; Chabert, Pascal Plasma Sources Science and Technology, Vol. 27, Issue 2 https://doi.org/10.1088/1361-6595/aaa86e	journal	February 2018
One-Dimensional Plasma Model Dawson, John Physics of Fluids, Vol. 5, Issue 4 https://doi.org/10.1063/1.1706638	journal	January 1962
Self‐consistent simulation of a parallel‐plate rf discharge Boswell, R. W.; Morey, I. J. Applied Physics Letters, Vol. 52, Issue 1 https://doi.org/10.1063/1.99327	journal	January 1988
Direct simulation Monte Carlo analysis of flows and etch rate in an inductively coupled plasma reactor Nanbu, K.; Morimoto, T.; Suetani, M. IEEE Transactions on Plasma Science, Vol. 27, Issue 5 https://doi.org/10.1109/27.799816	journal	January 1999
Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and cases Nanbu, K. IEEE Transactions on Plasma Science, Vol. 28, Issue 3 https://doi.org/10.1109/27.887765	journal	June 2000
Influence of metastable atoms in low pressure magnetized radio-frequency argon discharges Zheng, Bocong; Fu, Yangyang; Wen, De-qi Journal of Physics D: Applied Physics, Vol. 53, Issue 43 https://doi.org/10.1088/1361-6463/ab9f68	journal	July 2020
Simulation benchmarks for low-pressure plasmas: Capacitive discharges Turner, M. M.; Derzsi, A.; Donkó, Z. Physics of Plasmas, Vol. 20, Issue 1 https://doi.org/10.1063/1.4775084	journal	January 2013
Self-organizing plasma behavior in RF magnetron sputtering discharges Panjan, Matjaž Journal of Applied Physics, Vol. 125, Issue 20 https://doi.org/10.1063/1.5094240	journal	May 2019
Asymmetric particle fluxes from drifting ionization zones in sputtering magnetrons Panjan, Matjaž; Franz, Robert; Anders, André Plasma Sources Science and Technology, Vol. 23, Issue 2 https://doi.org/10.1088/0963-0252/23/2/025007	journal	March 2014
Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbO _x film growth Franz, Robert; Clavero, César; Kolbeck, Jonathan Plasma Sources Science and Technology, Vol. 25, Issue 1 https://doi.org/10.1088/0963-0252/25/1/015022	journal	January 2016
Broad, intense, quiescent beam of singly charged metal ions obtained by extraction from self-sputtering plasma far above the runaway threshold Anders, André; Oks, Efim Journal of Applied Physics, Vol. 106, Issue 2 https://doi.org/10.1063/1.3177336	journal	July 2009
High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition Anders, André Surface and Coatings Technology, Vol. 204, Issue 18-19 https://doi.org/10.1016/j.surfcoat.2010.01.047	journal	June 2010
Magnetical asymmetry effect in capacitively coupled plasmas: effects of the magnetic field gradient, pressure, and gap length Yang, Shali; Chang, Lijie; Zhang, Ya Plasma Sources Science and Technology, Vol. 27, Issue 3 https://doi.org/10.1088/1361-6595/aab47e	journal	March 2018
Measurement of the plasma potential in a magnetron discharge and the prediction of the electron drift speeds Bradley, J. W.; Thompson, S.; Gonzalvo, Y. Aranda Plasma Sources Science and Technology, Vol. 10, Issue 3 https://doi.org/10.1088/0963-0252/10/3/314	journal	July 2001
The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate Mishra, Anurag; Kelly, P. J.; Bradley, J. W. Plasma Sources Science and Technology, Vol. 19, Issue 4 https://doi.org/10.1088/0963-0252/19/4/045014	journal	June 2010
The 2D plasma potential distribution in a HiPIMS discharge Mishra, A.; Kelly, P. J.; Bradley, J. W. Journal of Physics D: Applied Physics, Vol. 44, Issue 42 https://doi.org/10.1088/0022-3727/44/42/425201	journal	October 2011
Plasma potential mapping of high power impulse magnetron sputtering discharges Rauch, Albert; Mendelsberg, Rueben J.; Sanders, Jason M. Journal of Applied Physics, Vol. 111, Issue 8 https://doi.org/10.1063/1.3700242	journal	April 2012
Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering Kuroiwa, Shunji; Mine, Teruyuki; Yagisawa, Takashi Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, Issue 5 https://doi.org/10.1116/1.2009771	journal	January 2005
Induced drift currents in circular planar magnetrons Rossnagel, S. M.; Kaufman, H. R. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 5, Issue 1 https://doi.org/10.1116/1.574822	journal	January 1987
Charge transport in magnetrons Rossnagel, S. M.; Kaufman, H. R. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 5, Issue 4 https://doi.org/10.1116/1.574434	journal	July 1987
High power impulse magnetron sputtering discharge Gudmundsson, J. T.; Brenning, N.; Lundin, D. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 3 https://doi.org/10.1116/1.3691832	journal	May 2012
Electron power absorption in low pressure capacitively coupled electronegative oxygen radio frequency plasmas Vass, Máté; Wilczek, Sebastian; Lafleur, Trevor Plasma Sources Science and Technology, Vol. 29, Issue 2 https://doi.org/10.1088/1361-6595/ab5f27	journal	February 2020
Observation of dominant Ohmic electron power absorption in capacitively coupled radio frequency argon discharges at low pressure Vass, Máté; Wilczek, Sebastian; Lafleur, Trevor Plasma Sources Science and Technology, Vol. 29, Issue 8 https://doi.org/10.1088/1361-6595/aba111	journal	August 2020
Low energy electron cooling induced by a magnetic field in high pressure capacitive radio frequency discharges You, S. J.; Kim, S. S.; Chang, H. Y. Applied Physics Letters, Vol. 85, Issue 21 https://doi.org/10.1063/1.1805704	journal	November 2004
Nonlocal to local transition of electron kinetic property in magnetized plasma You, S. J.; Chang, H. Y. Physics of Plasmas, Vol. 13, Issue 4 https://doi.org/10.1063/1.2171654	journal	April 2006
Magnetron sputtering: basic physics and application to cylindrical magnetrons Thornton, John A. Journal of Vacuum Science and Technology, Vol. 15, Issue 2 https://doi.org/10.1116/1.569448	journal	March 1978
Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons Phelps, A. V.; Petrovic, Z. Lj Plasma Sources Science and Technology, Vol. 8, Issue 3 https://doi.org/10.1088/0963-0252/8/3/201	journal	January 1999
The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas Daksha, M.; Derzsi, A.; Wilczek, S. Plasma Sources Science and Technology, Vol. 26, Issue 8 https://doi.org/10.1088/1361-6595/aa7c88	journal	July 2017
Electrical breakdown from macro to micro/nano scales: a tutorial and a review of the state of the art Fu, Yangyang; Zhang, Peng; Verboncoeur, John P. Plasma Research Express, Vol. 2, Issue 1 https://doi.org/10.1088/2516-1067/ab6c84	journal	February 2020
High-energy ballistic electrons in low-pressure radio-frequency plasmas Fu, Yangyang; Zheng, Bocong; Wen, De-Qi Plasma Sources Science and Technology, Vol. 29, Issue 9 https://doi.org/10.1088/1361-6595/abb21b	journal	September 2020

Similar Records

PIC-MCC/Fluid Hybrid Model for Low Pressure Capacitively Coupled O{sub 2} Plasma

Journal Article · Fri May 20 00:00:00 EDT 2011 · AIP Conference Proceedings · OSTI ID:1850776

Bera, Kallol; Rauf, Shahid; Collins, Ken

Magnetic probe diagnostics of nonlinear standing waves and bulk ohmic electron power absorption in capacitive discharges

Journal Article · Tue Sep 21 00:00:00 EDT 2021 · Plasma Science and Technology · OSTI ID:1850776

Zhao, Kai; Liu, Yongxin; Zhang, Quanzhi; +2 more

Effect of capacitive coupling in a miniature inductively coupled plasma source

Journal Article · Thu Nov 01 00:00:00 EDT 2012 · Journal of Applied Physics · OSTI ID:1850776

Takao, Yoshinori; Eriguchi, Koji; Ono, Kouichi

Related Subjects

Physics

Title: Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target

Citation Formats

References (134)

Similar Records

Related Subjects