On the electron energy in the high power impulse magnetron sputtering discharge

Journal Article · Mon Jun 15 04:00:00 EDT 2009 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3151953· OSTI ID:21352245

Gudmundsson, J T; Sigurjonsson, P ^[1]; Larsson, P; Lundin, D; Helmersson, U ^[2]

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1. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik (Iceland)
2. Plasma and Coatings Division, IFM-Materials Physics, Linkoeping University, SE-581 83 Linkoeping (Sweden)

The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures. In the HiPIMS discharge a high power pulse is applied to a planar magnetron giving a high electron density and highly ionized sputtered vapor. The measured EEDF is Maxwellian-like during the pulse; it is broader for lower discharge pressure and it becomes narrower as the pulse progresses. This indicates that the plasma cools as the pulse progresses, probably due to high metal content of the discharge.

• OSTI ID: 21352245
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 105; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ELECTRIC DISCHARGES
ELECTRIC PROBES
ELECTRON DENSITY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELECTRONS
ELEMENTARY PARTICLES
ELEMENTS
ENERGY SPECTRA
EQUIPMENT
FERMIONS
FLUIDS
GASES
LANGMUIR PROBE
LEPTONS
MAGNETRONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
PROBES
PULSES
SPECTRA
SPUTTERING
VAPORS