Formation of tubular conduction channel in a SiGe(P)/Si core/shell nanowire heterostructure
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
- National Taiwan Univ., Taipei (Taiwan)
- Nanyang Technological Univ. (Singapore)
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- National Taiwan Univ., Taipei (Taiwan); Taiwan Semiconductor Research Institute (Taiwan)
Realizing a tubular conduction channel within a one-dimensional core–shell nanowire (NW) enables better understanding of quantum phenomena and exploration of electronic device applications. Herein, we report the growth of a SiGe(P)/Si core/shell NW heterostructure using a chemical vapor deposition coupled with vapor–liquid–solid growth mechanism. The entire NW heterostructure behaves as a p-type semiconductor, which demonstrates that the high-density carriers are confined within the 4 nm-thick Si shell and form a tubular conduction channel. These findings are confirmed by both calculations and the gate-dependent current–voltage ( I d – V g ) characteristics. Atomic resolution microscopic analyses suggest a coherent epitaxial core/shell interface where strain is released by forming dislocations along the axial direction of the NW heterostructure. Additional surface passivation achieved via growing a SiGe(P)/Si/SiGe core/multishell NW heterostructure suggests potential strategies to enhance the tubular carrier density, which could be further modified by improving multishell crystallinity and structural design.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE National Nuclear Security Administration (NNSA); Ministry of Science and Technology; National Taiwan University
- Grant/Contract Number:
- 89233218CNA000001; 20200672DI; NA0003525; 110-2622-8-002-014
- OSTI ID:
- 1898359
- Alternate ID(s):
- OSTI ID: 1897335
- Report Number(s):
- LA-UR-22-21355; TRN: US2311066
- Journal Information:
- APL Materials, Vol. 10, Issue 11; ISSN 2166-532X
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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