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Title: Development of low thermal budget Si epitaxy and high-k/ metal gate stack for atomically precise electronic devices.

Conference ·
DOI:https://doi.org/10.2172/1894018· OSTI ID:1894018

Abstract not provided.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
DOE Contract Number:
NA0003525
OSTI ID:
1894018
Report Number(s):
SAND2021-13295C; 701115
Resource Relation:
Conference: Proposed for presentation at the AVS 67 Virtual Symposium held October 25-28, 2021 in ,
Country of Publication:
United States
Language:
English

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