Ultrathin and Conformal Initiated Chemical-Vapor-Deposited Layers of Systematically Varied Surface Energy for Controlling the Directed Self-Assembly of Block CoPolymers

Moni, Priya; Suh, Hyo Seon; Dolejsi, Moshe; Kim, Do Han; Mohr, Alan C.; Nealey, Paul F.; Gleason, Karen K.

doi:10.1021/acs.langmuir.8b00173

Ultrathin and Conformal Initiated Chemical-Vapor-Deposited Layers of Systematically Varied Surface Energy for Controlling the Directed Self-Assembly of Block CoPolymers

Journal Article · Wed Mar 21 00:00:00 EDT 2018 · Langmuir

DOI:https://doi.org/10.1021/acs.langmuir.8b00173· OSTI ID:1882166

^[1]; Suh, Hyo Seon ^[2]; Dolejsi, Moshe ^[3]; Kim, Do Han ^[1]; Mohr, Alan C. ^[1]; ^[2]; ^[1]

Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Univ. of Chicago, IL (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
Univ. of Chicago, IL (United States)

Directed self-assembly (DSA) of block copolymer (BCP) thin films is a promising approach to enable next-generation patterning at increasingly smaller length scales. DSA utilizes interfacial wetting layers to force the BCP domains to self-assemble with the desired orientation with respect to the substrate. Here, we demonstrate that initiated chemical-vapor-deposited (iCVD) polydivinylbenzene (pDVB) ultrathin films can direct the self-assembly of poly(styrene-block-methylmethacrylate). Here, we found that the methyl radicals formed at increased filament temperatures during the iCVD process result in the backbone methylation of pDVB. By tuning the degree of backbone methylation, we systematically changed the wetting properties of the iCVD pDVB from a slight poly(methylmethacrylate) preference to complete poly(styrene) preference. Additionally, we utilize the conformal nature of the iCVD to form a wetting layer over a topographical line and space pattern, which is subsequently used to produce self-assembled BCP films with both perpendicular orientation and long-range alignment.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: National Science Foundation (NSF); U.S. Army Research Laboratory, U.S. Army Research Office (ARO); USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1882166

Journal Information:: Langmuir, Journal Name: Langmuir Journal Issue: 15 Vol. 34; ISSN 0743-7463

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal Wang, Hyun Suk; Kim, Ki Hyun; Bang, Joona Macromolecular Rapid Communications, Vol. 40, Issue 4 https://doi.org/10.1002/marc.201800728	journal	November 2018
High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers Wang, Hyun Suk; Oh, Seula; Choi, Junhwan Macromolecular Rapid Communications, Vol. 41, Issue 4 https://doi.org/10.1002/marc.202070008	journal	February 2020

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37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
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Ultrathin and Conformal Initiated Chemical-Vapor-Deposited Layers of Systematically Varied Surface Energy for Controlling the Directed Self-Assembly of Block CoPolymers

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