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Three Dimensional Assembly in Directed Self-assembly of Block Copolymers

Journal Article · · Journal of Photopolymer Science and Technology
 [1];  [2];  [2];  [3];  [4];  [4];  [1]
  1. Univ. of Chicago, IL (United States). Inst. for Molecular Engineering; Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
  2. Univ. of Chicago, IL (United States). Inst. for Molecular Engineering
  3. Tokyo Ohka Kogyo Co., Ltd., Kanagawa (Japan)
  4. Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
+ Show Author Affiliations
The three-dimensional assembly of poly (styrene-b-methyl methacrylate) (PS-b-PMMA) in chemoepitaxy and graphoepitaxy directed self-assembly (DSA) was investigated using scanning transmission electron microscopy (STEM) tomography. The tomographic characterization revealed hidden morphologies and defects at the BCP- chemical pattern interface in lamellar DSA, and probed the formation of cylinders at the bottom of cylindrical DSA for contact hole shrink. Lastly, future work will include control over 3D assembly in sub-10 nm processes.
Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1352873
Journal Information:
Journal of Photopolymer Science and Technology, Journal Name: Journal of Photopolymer Science and Technology Journal Issue: 5 Vol. 29; ISSN 0914-9244; ISSN JSTEEW
Publisher:
The Society of Photopolymer Science and Technology (SPST)Copyright Statement
Country of Publication:
United States
Language:
English

Cited By (1)

Quaternization of a Polystyrene‐ block ‐poly(4‐vinylpyridine) Isoporous Membrane: An Approach to Tune the Pore Size and the Charge Density journal November 2018

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Related Subjects

36 MATERIALS SCIENCE
Directed self-assembly
block copolymer
lithography
contact hole
metrology
transmission electron microscopy