Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F.

doi:10.1038/nnano.2017.34

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Journal Article · Mon Mar 27 00:00:00 EDT 2017 · Nature Nanotechnology

DOI:https://doi.org/10.1038/nnano.2017.34· OSTI ID:1373307

Suh, Hyo Seon ^[1]; Kim, Do Han ^[2]; Moni, Priya ^[2]; Xiong, Shisheng ^[1]; ^[3]; Zaluzec, Nestor J. ^[3]; Gleason, Karen K. ^[2]; Nealey, Paul F. ^[1]

Univ. of Chicago, Chicago, IL (United States); Argonne National Lab. (ANL), Argonne, IL (United States)
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)

Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is a promising approach for sub-10-nm surface patterning. DSA requires the control of interfacial properties on both interfaces of a BCP film to induce the formation of domains that traverse the entire film with a perpendicular orientation. Here we show a methodology to control the interfacial properties of BCP films that uses a polymer topcoat deposited by initiated chemical vapour deposition (iCVD). The iCVD topcoat forms a crosslinked network that grafts to and immobilizes BCP chains to create an interface that is equally attractive to both blocks of the underlying copolymer. The topcoat, in conjunction with a chemically patterned substrate, directs the assembly of the grating structures in BCP films with a half-pitch dimension of 9.3 nm. As the iCVD topcoat can be as thin as 7 nm, it is amenable to pattern transfer without removal. As a result, the ease of vapour-phase deposition, applicability to high-resolution BCP systems and integration with pattern-transfer schemes are attractive properties of iCVD topcoats for industrial applications.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22), Materials Sciences and Engineering Division; National Science Foundation (NSF); U.S. Army Research Laboratory - U.S. Army Research Office (ARO)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1373307

Journal Information:: Nature Nanotechnology, Journal Name: Nature Nanotechnology Journal Issue: 6 Vol. 12; ISSN 1748-3387

Publisher:: Nature Publishing GroupCopyright Statement

Country of Publication:: United States

Language:: English

References (42)

Initiated and Oxidative Chemical Vapor Deposition of Polymeric Thin Films: iCVD and oCVD Tenhaeff, Wyatt E.; Gleason, Karen K. Advanced Functional Materials, Vol. 18, Issue 7 https://doi.org/10.1002/adfm.200701479	journal	April 2008
Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation Kim, S. H.; Misner, M. J.; Xu, T. Advanced Materials, Vol. 16, Issue 3, p. 226-231 https://doi.org/10.1002/adma.200304906	journal	February 2004
Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers Cheng, Joy Y.; Rettner, Charles T.; Sanders, Daniel P. Advanced Materials, Vol. 20, Issue 16 https://doi.org/10.1002/adma.200800826	journal	August 2008
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers Peng, Qing; Tseng, Yu-Chih; Darling, Seth B. Advanced Materials, Vol. 22, Issue 45, p. 5129-5133 https://doi.org/10.1002/adma.201002465	journal	September 2010
Organic Vapor Passivation of Silicon at Room Temperature Yang, Rong; Buonassisi, Tonio; Gleason, Karen K. Advanced Materials, Vol. 25, Issue 14 https://doi.org/10.1002/adma.201204382	journal	January 2013
25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication Coclite, Anna Maria; Howden, Rachel M.; Borrelli, David C. Advanced Materials, Vol. 25, Issue 38 https://doi.org/10.1002/adma.201301878	journal	September 2013
A Route Towards Sustainability Through Engineered Polymeric Interfaces Reeja-Jayan, B.; Kovacik, Peter; Yang, Rong Advanced Materials Interfaces, Vol. 1, Issue 4 https://doi.org/10.1002/admi.201400117	journal	May 2014
Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers Inoue, Takejiro; Janes, Dustin W.; Ren, Jiaxing Advanced Materials Interfaces, Vol. 2, Issue 10 https://doi.org/10.1002/admi.201500133	journal	May 2015
Free-Radical Approach to 4-Substituted Dipicolinates Shelkov, Rimma; Melman, Artem European Journal of Organic Chemistry, Vol. 2005, Issue 7 https://doi.org/10.1002/ejoc.200400637	journal	April 2005
Nucleophilic character of alkyl radicals—VI Minisci, F.; Bernardi, R.; Bertini, F. Tetrahedron, Vol. 27, Issue 15 https://doi.org/10.1016/S0040-4020(01)97768-3	journal	January 1971
X-ray and neutron reflectivity for the investigation of polymers Russell, T. P. Materials Science Reports, Vol. 5, Issue 4 https://doi.org/10.1016/S0920-2307(05)80002-7	journal	January 1990
Large-scale initiated chemical vapor deposition of poly(glycidyl methacrylate) thin films Gupta, Malancha; Gleason, Karen K. Thin Solid Films, Vol. 515, Issue 4 https://doi.org/10.1016/j.tsf.2006.05.021	journal	December 2006
Experimental and Modeling Study of Domain Orientation in Confined Block Copolymer Thin Films Durand, William J.; Carlson, Matthew C.; Maher, Michael J. Macromolecules, Vol. 49, Issue 1 https://doi.org/10.1021/acs.macromol.5b02262	journal	December 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS- b -PMOST Cushen, Julia; Wan, Lei; Blachut, Gregory ACS Applied Materials & Interfaces, Vol. 7, Issue 24 https://doi.org/10.1021/acsami.5b02481	journal	June 2015
High χ–Low N Block Polymers: How Far Can We Go? Sinturel, Christophe; Bates, Frank S.; Hillmyer, Marc A. ACS Macro Letters, Vol. 4, Issue 9 https://doi.org/10.1021/acsmacrolett.5b00472	journal	September 2015
The Limits of Lamellae-Forming PS- b -PMMA Block Copolymers for Lithography Wan, Lei; Ruiz, Ricardo; Gao, He ACS Nano, Vol. 9, Issue 7 https://doi.org/10.1021/acsnano.5b02613	journal	June 2015
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing Xiong, Shisheng; Wan, Lei; Ishida, Yoshihito ACS Nano, Vol. 10, Issue 8 https://doi.org/10.1021/acsnano.6b03667	journal	July 2016
Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films Maher, Michael J.; Rettner, Charles T.; Bates, Christopher M. ACS Applied Materials & Interfaces, Vol. 7, Issue 5 https://doi.org/10.1021/am508197k	journal	January 2015
Control of the Orientation of Symmetric Poly(styrene)- block -poly( d , l -lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition Keen, Imelda; Yu, Anguang; Cheng, Han-Hao Langmuir, Vol. 28, Issue 45 https://doi.org/10.1021/la304141m	journal	October 2012
Cross-Linking and Ultrathin Grafted Gradation of Fluorinated Polymers Synthesized via Initiated Chemical Vapor Deposition To Prevent Surface Reconstruction Liu, Andong; Goktekin, Esma; Gleason, Karen K. Langmuir, Vol. 30, Issue 47 https://doi.org/10.1021/la503343x	journal	November 2014
Temperature dependence of the interaction parameter of polystyrene and poly(methyl methacrylate) Russell, Thomas P.; Hjelm, Rex P.; Seeger, Phil A. Macromolecules, Vol. 23, Issue 3 https://doi.org/10.1021/ma00205a033	journal	May 1990
Initiated Chemical Vapor Deposition (iCVD) of Poly(alkyl acrylates): An Experimental Study Lau, Kenneth K. S.; Gleason, Karen K. Macromolecules, Vol. 39, Issue 10 https://doi.org/10.1021/ma0601619	journal	May 2006
Controllable Cross-Linking of Vapor-Deposited Polymer Thin Films and Impact on Material Properties Petruczok, Christy D.; Yang, Rong; Gleason, Karen K. Macromolecules, Vol. 46, Issue 5 https://doi.org/10.1021/ma302566r	journal	February 2013
Solvent Vapor Annealing of Block Polymer Thin Films Sinturel, Christophe; Vayer, Marylène; Morris, Michael Macromolecules, Vol. 46, Issue 14 https://doi.org/10.1021/ma400735a	journal	June 2013
Control of Directed Self-Assembly in Block Polymers by Polymeric Topcoats Ramírez-Hernández, Abelardo; Suh, Hyo Seon; Nealey, Paul F. Macromolecules, Vol. 47, Issue 10 https://doi.org/10.1021/ma500411q	journal	May 2014
SAXS Analysis of the Order−Disorder Transition and the Interaction Parameter of Polystyrene- block -poly(methyl methacrylate) Zhao, Yue; Sivaniah, Easan; Hashimoto, Takeji Macromolecules, Vol. 41, Issue 24 https://doi.org/10.1021/ma8013004	journal	December 2008
Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films Ji, Shengxiang; Liu, Chi-Chun; Son, Jeong Gon Macromolecules, Vol. 41, Issue 23 https://doi.org/10.1021/ma801861h	journal	December 2008
Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films Kim, Sangwon; Nealey, Paul F.; Bates, Frank S. ACS Macro Letters, Vol. 1, Issue 1 https://doi.org/10.1021/mz2000169	journal	November 2011
Rectangular Patterns Using Block Copolymer Directed Assembly for High Bit Aspect Ratio Patterned Media Ruiz, Ricardo; Dobisz, Elizabeth; Albrecht, Thomas R. ACS Nano, Vol. 5, Issue 1 https://doi.org/10.1021/nn101561p	journal	December 2010
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS- b -PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication Tsai, Hsinyu; Pitera, Jed W.; Miyazoe, Hiroyuki ACS Nano, Vol. 8, Issue 5 https://doi.org/10.1021/nn501300b	journal	April 2014
The dedicated high-resolution grazing-incidence X-ray scattering beamline 8-ID-E at the Advanced Photon Source Jiang, Zhang; Li, Xuefa; Strzalka, Joseph Journal of Synchrotron Radiation, Vol. 19, Issue 4 https://doi.org/10.1107/S0909049512022017	journal	June 2012
Transition between kinetic and mass transfer regimes in the initiated chemical vapor deposition from ethylene glycol diacrylate Ozaydin-Ince, Gozde; Gleason, Karen K. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 27, Issue 5 https://doi.org/10.1116/1.3168553	journal	September 2009
Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment Delgadillo, Paulina A. Rincon Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3 https://doi.org/10.1117/1.JMM.11.3.031302	journal	July 2012
Plasma etch transfer of self-assembled polymer patterns Johnston, Danvers E. Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3 https://doi.org/10.1117/1.JMM.11.3.031306	journal	July 2012
Towards electrical testable SOI devices using Directed Self-Assembly for fin formation Liu, Chi-Chun; Estrada-Raygoza, Cristina; He, Hong SPIE Advanced Lithography, SPIE Proceedings https://doi.org/10.1117/12.2046462	conference	March 2014
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Ruiz, R.; Kang, H.; Detcheverry, F. A. Science, Vol. 321, Issue 5891 https://doi.org/10.1126/science.1157626	journal	August 2008
Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates Bita, I.; Yang, J. K. W.; Jung, Y. S. Science, Vol. 321, Issue 5891 https://doi.org/10.1126/science.1159352	journal	August 2008
Polarity-Switching Top Coats Enable Orientation of Sub-10-nm Block Copolymer Domains Bates, C. M.; Seshimo, T.; Maher, M. J. Science, Vol. 338, Issue 6108 https://doi.org/10.1126/science.1226046	journal	November 2012
Current Trends and Challenges in Biointerfaces Science and Engineering Ross, A. M.; Lahann, J. Annual Review of Chemical and Biomolecular Engineering, Vol. 6, Issue 1 https://doi.org/10.1146/annurev-chembioeng-060713-040042	journal	July 2015
Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes Hawker, Craig J.; Russell, Thomas P. MRS Bulletin, Vol. 30, Issue 12, p. 952-966 https://doi.org/10.1557/mrs2005.249	journal	December 2005
20nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media Bosworth, Joan K.; Dobisz, Elizabeth; Ruiz, Ricardo Journal of Photopolymer Science and Technology, Vol. 23, Issue 2 https://doi.org/10.2494/photopolymer.23.145	journal	January 2010
Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films Yoshida, Hiroshi; Suh, Hyo Seon; Ramirez-Herunandez, Abelardo Journal of Photopolymer Science and Technology, Vol. 26, Issue 1 https://doi.org/10.2494/photopolymer.26.55	journal	January 2013

Cited By (41)

Rapid Synthesis of Nanoporous Conformal Coatings via Plasma-Enhanced Sequential Infiltration of a Polymer Template She, Yunlong; Lee, Jihyung; Diroll, Benjamin T. ACS Omega, Vol. 2, Issue 11 https://doi.org/10.1021/acsomega.7b01314	journal	November 2017
Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker Choi, Chungryong; Park, Jichoel; Vincent Joseph, Kanniyambatti L. Nature Communications, Vol. 8, Issue 1 https://doi.org/10.1038/s41467-017-02019-9	journal	November 2017
Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy Huang, Qiushi; jia, Qi; Feng, Jiangtao Nature Communications, Vol. 10, Issue 1 https://doi.org/10.1038/s41467-019-10095-2	journal	June 2019
Ultra-dense (~20 Tdot/in2) nanoparticle array from an ordered supramolecular dendrimer containing a metal precursor Kwon, Kiok; Suh, Bong Lim; Park, Kangho Scientific Reports, Vol. 9, Issue 1 https://doi.org/10.1038/s41598-019-40363-6	journal	March 2019
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers Evangelio, Laura; Gramazio, Federico; Lorenzoni, Matteo Beilstein Journal of Nanotechnology, Vol. 8 https://doi.org/10.3762/bjnano.8.198	journal	September 2017
Thermodynamic and Kinetic Tuning of Block Copolymer Based on Random Copolymerization for High-Quality Sub-6 nm Pattern Formation Hur, Yoon Hyung; Song, Seung Won; Kim, Jong Min Advanced Functional Materials, Vol. 28, Issue 28 https://doi.org/10.1002/adfm.201800765	journal	May 2018
Sub‐5 nm Dendrimer Directed Self‐Assembly with Large‐Area Uniform Alignment by Graphoepitaxy Park, Kangho; Jung, Woo‐Bin; Kwon, Kiok Advanced Functional Materials, Vol. 29, Issue 26 https://doi.org/10.1002/adfm.201901876	journal	March 2019
Smart Nanostructured Materials based on Self‐Assembly of Block Copolymers Kim, Jang Hwan; Jin, Hyeong Min; Yang, Geon Gug Advanced Functional Materials, Vol. 30, Issue 2 https://doi.org/10.1002/adfm.201902049	journal	June 2019
Direct In Situ Observation of the Early‐Stage Disorder–Order Evolution of Perpendicular Lamellae in Thermally Annealed High‐χ Block Copolymer Thin Films Chandra, Alvin; Nakatani, Ryuichi; Uchiyama, Takumi Advanced Materials Interfaces https://doi.org/10.1002/admi.201801401	journal	April 2019
Janus Graft Block Copolymers: Design of a Polymer Architecture for Independently Tuned Nanostructures and Polymer Properties Guo, Zi-Hao; Le, An N.; Feng, Xunda Angewandte Chemie, Vol. 130, Issue 28 https://doi.org/10.1002/ange.201802844	journal	May 2018
Janus Graft Block Copolymers: Design of a Polymer Architecture for Independently Tuned Nanostructures and Polymer Properties Guo, Zi-Hao; Le, An N.; Feng, Xunda Angewandte Chemie International Edition, Vol. 57, Issue 28 https://doi.org/10.1002/anie.201802844	journal	May 2018
Hydrogen Bond Induces Hierarchical Self-Assembly in Liquid-Crystalline Block Copolymers Huang, Shuai; Pang, Linlin; Chen, Yuxuan Macromolecular Rapid Communications, Vol. 39, Issue 6 https://doi.org/10.1002/marc.201700783	journal	February 2018
Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal Wang, Hyun Suk; Kim, Ki Hyun; Bang, Joona Macromolecular Rapid Communications, Vol. 40, Issue 4 https://doi.org/10.1002/marc.201800728	journal	November 2018
High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers Wang, Hyun Suk; Oh, Seula; Choi, Junhwan Macromolecular Rapid Communications, Vol. 41, Issue 4 https://doi.org/10.1002/marc.201900514	journal	January 2020
High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers Wang, Hyun Suk; Oh, Seula; Choi, Junhwan Macromolecular Rapid Communications, Vol. 41, Issue 4 https://doi.org/10.1002/marc.202070008	journal	February 2020
Homopolymer Nanolithography Tebbe, Moritz; Galati, Elizabeth; Walker, Gilbert C. Small, Vol. 13, Issue 37 https://doi.org/10.1002/smll.201702043	journal	July 2017
Directed Self-Assembly of Templatable Block Copolymers by Easily Accessible Magnetic Control Yue, Bingbing; Jin, Xin; Zhao, Pei Small, Vol. 15, Issue 7 https://doi.org/10.1002/smll.201804572	journal	January 2019
Metal Oxide Heterostructure Array via Spatially Controlled–Growth within Block Copolymer Templates Azoulay, Rotem; Shomrat, Neta; Weisbord, Inbal Small https://doi.org/10.1002/smll.201904657	journal	October 2019
Promising Lithography Techniques for Next-Generation Logic Devices Hasan, Rashed Md. Murad; Luo, Xichun Nanomanufacturing and Metrology, Vol. 1, Issue 2 https://doi.org/10.1007/s41871-018-0016-9	journal	April 2018
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond Liu, Chi-Chun; Franke, Elliott; Mignot, Yann Nature Electronics, Vol. 1, Issue 10 https://doi.org/10.1038/s41928-018-0147-4	journal	October 2018
Extreme ultraviolet resist materials for sub-7 nm patterning Li, Li; Liu, Xuan; Pal, Shyam Chemical Society Reviews, Vol. 46, Issue 16 https://doi.org/10.1039/c7cs00080d	journal	January 2017
Magnetization switching in high-density magnetic nanodots by a fine-tune sputtering process on a large-area diblock copolymer mask Barrera, G.; Celegato, F.; Coïsson, M. Nanoscale, Vol. 9, Issue 43 https://doi.org/10.1039/c7nr04295g	journal	January 2017
Long-range single domain array of a 5 nm pattern of supramolecules via solvent annealing in a double-sandwich cell Kwon, Kiok; Park, Kangho; Jung, Hee-Tae Nanoscale, Vol. 10, Issue 18 https://doi.org/10.1039/c8nr01291a	journal	January 2018
Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale Staaks, Daniel; Olynick, Deirdre L.; Rangelow, Ivo W. Nanoscale, Vol. 10, Issue 48 https://doi.org/10.1039/c8nr06669h	journal	January 2018
Self-assembly of a silicon-containing side-chain liquid crystalline block copolymer in bulk and in thin films: kinetic pathway of a cylinder to sphere transition Liao, Fen; Shi, Ling-Ying; Cheng, Li-Chen Nanoscale, Vol. 11, Issue 1 https://doi.org/10.1039/c8nr07685e	journal	January 2019
Reactive block copolymers for patterned surface immobilization with sub-30 nm spacing Turgut, Hatice; Dingenouts, Nico; Trouillet, Vanessa Polymer Chemistry, Vol. 10, Issue 11 https://doi.org/10.1039/c8py01777h	journal	January 2019
Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurability Gottlieb, Steven; Kazazis, Dimitrios; Mochi, Iacopo Soft Matter, Vol. 14, Issue 33 https://doi.org/10.1039/c8sm01045e	journal	January 2018
Sub-5 nm structured films by hydrogen bonded siloxane liquid crystals and block copolymers Nickmans, Koen; Verpaalen, Rob C. P.; Murphy, Jeffrey N. Journal of Materials Chemistry C, Vol. 6, Issue 12 https://doi.org/10.1039/c8tc00627j	journal	January 2018
Customizing topographical templates for aperiodic nanostructures of block copolymers via inverse design Zhang, Runrong; Zhang, Liangshun; Lin, Jiaping Physical Chemistry Chemical Physics, Vol. 21, Issue 15 https://doi.org/10.1039/c9cp00712a	journal	January 2019
Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid Li, Dongxue; Zhou, Chun; Xiong, Shisheng Soft Matter, Vol. 15, Issue 48 https://doi.org/10.1039/c9sm02039j	journal	January 2019
Scattering-mediated absorption from heterogeneous nanoparticle assemblies in diblock copolymer micelles for SERS enhancement Zakia, Maulida; Song, Hyerin; Song, Chang Hyeon Journal of Materials Chemistry C, Vol. 7, Issue 17 https://doi.org/10.1039/c9tc00464e	journal	January 2019
Research Update: Electron beam-based metrology after CMOS Liddle, J. A.; Hoskins, B. D.; Vladár, A. E. APL Materials, Vol. 6, Issue 7 https://doi.org/10.1063/1.5038249	journal	July 2018
Dissipative particle dynamics for directed self-assembly of block copolymers Huang, Hejin; Alexander-Katz, Alfredo The Journal of Chemical Physics, Vol. 151, Issue 15 https://doi.org/10.1063/1.5117839	journal	October 2019
Size-dependent single electron transfer and semi-metal-to-insulator transitions in molecular metal oxide electronics Balliou, Angelika; Bouroushian, Mirtat; Douvas, Antonios M. Nanotechnology, Vol. 29, Issue 27 https://doi.org/10.1088/1361-6528/aabdc3	journal	May 2018
Thermal stability of L1 ₀ -FePt nanodots patterned by self-assembled block copolymer lithography Fernandez, Eduardo; Tu, Kun-Hua; Ho, Pin Nanotechnology, Vol. 29, Issue 46 https://doi.org/10.1088/1361-6528/aade2f	journal	September 2018
X-ray characterization of contact holes for block copolymer lithography Sunday, Daniel F.; Delachat, Florian; Gharbi, Ahmed Journal of Applied Crystallography, Vol. 52, Issue 1 https://doi.org/10.1107/s1600576718017272	journal	February 2019
X-ray characterization of contact holes for block copolymer lithography Sunday, Daniel F.; Delachat, Florian; Gharbi, Ahmed International Union of Crystallography (IUCr) https://doi.org/10.1107/s1600576718017272/vh5090sup1.pdf	text	January 2019
PMMA-Assisted Plasma Patterning of Graphene Bobadilla, Alfredo D.; Ocola, Leonidas E.; Sumant, Anirudha V. Journal of Nanotechnology, Vol. 2018 https://doi.org/10.1155/2018/8349626	journal	August 2018
Polarization-insensitive, ultra-broadband, and compact metamaterial-inspired optical absorber via wide-angle and highly efficient performances Mehrabi, Mohammad; Rajabalipanah, Hamid; Abdolali, Ali Applied Optics, Vol. 57, Issue 14 https://doi.org/10.1364/ao.57.003693	journal	January 2018
Dissipative Particle Dynamics for Directed Self-Assembly of Block Copolymers Huang, Hejin; Alexander-Katz, Alfredo arXiv https://doi.org/10.48550/arxiv.1907.01044	text	January 2019
Reactive block copolymers for patterned surface immobilization with sub-30 nm spacing Turgut, Hatice; Dingenouts, Nico; Trouillet, Vanessa Karlsruhe https://doi.org/10.5445/ir/1000092663	text	January 2019

Similar Records

Ultrathin and Conformal Initiated Chemical-Vapor-Deposited Layers of Systematically Varied Surface Energy for Controlling the Directed Self-Assembly of Block CoPolymers

Journal Article · Wed Mar 21 00:00:00 EDT 2018 · Langmuir · OSTI ID:1882166

Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives

Journal Article · Thu Jul 25 00:00:00 EDT 2019 · Journal of Micro/Nanolithography, MEMS, and MOEMS · OSTI ID:1880537

Related Subjects

36 MATERIALS SCIENCE

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Citation Formats

References (42)

Cited By (41)

Similar Records

Related Subjects