Orientation control of high-χ triblock copolymer for sub-10&nbsp;nm patterning using fluorine-containing polymeric additives

Li, Jiajing; Zhou, Chun; Chen, Xuanxuan; Rincon-Delgadillo, Paulina A.; Nealey, Paul F.

doi:10.1117/1.jmm.18.3.035501

Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives

Journal Article · Thu Jul 25 00:00:00 EDT 2019 · Journal of Micro/Nanolithography, MEMS, and MOEMS

DOI:https://doi.org/10.1117/1.jmm.18.3.035501· OSTI ID:1880537

Li, Jiajing ^[1]; Zhou, Chun ^[1]; Chen, Xuanxuan ^[1]; Rincon-Delgadillo, Paulina A. ^[2]; Nealey, Paul F. ^[3]

Univ. of Chicago, IL (United States)
Interuniversity Microelectronics Centre (IMEC), Leuven (Belgium)
Univ. of Chicago, IL (United States); Argonne National Lab. (ANL), Argonne, IL (United States)

Directed self-assembly (DSA) of block copolymers (BCPs) Is one of the most promising techniques to tackle the ever-increasing demand for subllthographic features In semiconductor industries. BCPs with high Flory-Huggins parameter (chi) are of particular Interest due to their ability to self-assemble at the length scale of sub-10 nm. However, such high-chi BCPs typically have imbalanced surface energies between respective blocks, making it a challenge to achieve desired perpendicular orientation. To address this challenge, we mixed a fluorine-containing polymeric additive with poly(2-vlnylpyrldine)-block-polystyrene-block-poly(2-vlnylpyrldine) (P2VP-b-PS-b-P2VP) and successfully controlled the orientation of the high-chi triblock copolymer. The additive selectively mixes with P2VP block through hydrogen bonding and can reduce the dissimilarity of surface energies between PS and P2VP blocks. After optimizing additive dose and annealing conditions, desired perpendicular orientation formed upon simple thermal annealing. We further demonstrated DSA of this material system with five times density multiplication and a half-pitch as small as 8.5 nm. This material system Is also amenable to sequential Infiltration synthesis treatment to selectively grow metal oxide In P2VP domains, which can facilitate the subsequent pattern transfer. We believe that this integration-friendly DSA platform using simple thermal annealing holds the great potential for sub-10 nm nanopatterning applications.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1880537

Journal Information:: Journal of Micro/Nanolithography, MEMS, and MOEMS, Journal Name: Journal of Micro/Nanolithography, MEMS, and MOEMS Journal Issue: 03 Vol. 18; ISSN 1932-5150

Publisher:: SPIECopyright Statement

Country of Publication:: United States

Language:: English

References (17)

Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer Zhang, Jieqian; Clark, Michael B.; Wu, Chunyi Nano Letters, Vol. 16, Issue 1 https://doi.org/10.1021/acs.nanolett.5b04602	journal	December 2015
Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives Vora, Ankit; Schmidt, Kristin; Alva, Gabriela ACS Applied Materials & Interfaces, Vol. 8, Issue 43 https://doi.org/10.1021/acsami.6b11293	journal	October 2016
The Limits of Lamellae-Forming PS- b -PMMA Block Copolymers for Lithography Wan, Lei; Ruiz, Ricardo; Gao, He ACS Nano, Vol. 9, Issue 7 https://doi.org/10.1021/acsnano.5b02613	journal	June 2015
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing Xiong, Shisheng; Wan, Lei; Ishida, Yoshihito ACS Nano, Vol. 10, Issue 8 https://doi.org/10.1021/acsnano.6b03667	journal	July 2016
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E. The Journal of Physical Chemistry C, Vol. 115, Issue 36, p. 17725-17729 https://doi.org/10.1021/jp205532e	journal	July 2011
Molecular weight dependence of lamellar domain spacing of diblock copolymers in bulk Matsushita, Yushu; Mori, Katsuaki; Saguchi, Ryuichi Macromolecules, Vol. 23, Issue 19 https://doi.org/10.1021/ma00221a019	journal	September 1990
Surface Tension and Melt Cohesive Energy Density of Polymer Melts Including High Melting and High Glass Transition Polymers Sauer, Bryan B.; Dee, Gregory T. Macromolecules, Vol. 35, Issue 18 https://doi.org/10.1021/ma0202437	journal	August 2002
Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats Liu, Chi-Chun; Han, Eungnak; Onses, M. Serdar Macromolecules, Vol. 44, Issue 7 https://doi.org/10.1021/ma102856t	journal	April 2011
Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features Liu, Chi-Chun; Ramírez-Hernández, Abelardo; Han, Eungnak Macromolecules, Vol. 46, Issue 4 https://doi.org/10.1021/ma302464n	journal	February 2013
Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films Ji, Shengxiang; Liu, Chi-Chun; Son, Jeong Gon Macromolecules, Vol. 41, Issue 23 https://doi.org/10.1021/ma801861h	journal	December 2008
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates Ouk Kim, Sang; Solak, Harun H.; Stoykovich, Mark P. Nature, Vol. 424, Issue 6947, p. 411-414 https://doi.org/10.1038/nature01775	journal	July 2003
Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat Suh, Hyo Seon; Kim, Do Han; Moni, Priya Nature Nanotechnology, Vol. 12, Issue 6 https://doi.org/10.1038/nnano.2017.34	journal	March 2017
Pattern transfer using block copolymers Gu, Xiaodan; Gunkel, Ilja; Russell, Thomas P. Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences, Vol. 371, Issue 2000 https://doi.org/10.1098/rsta.2012.0306	journal	October 2013
Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment Delgadillo, Paulina A. Rincon Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 3 https://doi.org/10.1117/1.JMM.11.3.031302	journal	July 2012
Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow Gronheid, Roel; Rincon Delgadillo, Paulina; Pathangi, Hari SPIE Advanced Lithography, SPIE Proceedings https://doi.org/10.1117/12.2047265	conference	March 2014
Directed self-assembly of triblock copolymers for sub-10 nm nanofabrication using polymeric additives Nealey, Paul; Li, Jiajing; Zhou, Chun Advances in Patterning Materials and Processes XXXV https://doi.org/10.1117/12.2296857	conference	March 2018
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Ruiz, R.; Kang, H.; Detcheverry, F. A. Science, Vol. 321, Issue 5891 https://doi.org/10.1126/science.1157626	journal	August 2008

Similar Records

Directed Self-Assembly of Polystyrene- b -poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography

Journal Article · Sun Jan 22 23:00:00 EST 2017 · Nano Letters · OSTI ID:1393466

Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Journal Article · Wed Nov 05 19:00:00 EST 2014 · Nanoscale · OSTI ID:1357472

High-χ diblock copolymers containing poly(vinylpyridine-N-oxide) segments

Journal Article · Wed Apr 19 20:00:00 EDT 2023 · Journal of Materials Chemistry. A · OSTI ID:1986223

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
block copolymer
directed self-assembly
lithography
sequential infiltration synthesis
sub-10 nm

Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives

Citation Formats

References (17)

Similar Records

Related Subjects