Superlattice structure including two-dimensional material and device including the superlattice structure
Patent
·
OSTI ID:1860129
Provided are a superlattice structure including a two-dimensional material and a device including the superlattice structure. The superlattice structure may include at least two different two-dimensional (2D) materials bonded to each other in a lateral direction, and an interfacial region of the at least two 2D materials may be strained. The superlattice structure may have a bandgap adjusted by the interfacial region that is strained. The at least two 2D materials may include first and second 2D materials. The first 2D material may have a first bandgap in an intrinsic state thereof. The second 2D material may have a second bandgap in an intrinsic state thereof. An interfacial region of the first and second 2D materials and an adjacent region may have a third bandgap between the first bandgap and the second bandgap.
- Research Organization:
- Samsung Electronics Co., Ltd., Gyeonggi (South Korea); Cornell Univ., Ithaca, NY (United States); Univ. of Chicago, IL (United States)
- Sponsoring Organization:
- USDOE; US Air Force Office of Scientific Research (AFOSR); National Science Foundation (NSF)
- Assignee:
- Samsung Electronics Co., Ltd. (Gyeonggi-do, KR); Center for Technology Licensing at Cornell University (Ithaca, NY); The University of Chicago (Chicago, IL)
- Patent Number(s):
- 11,189,699
- Application Number:
- 16/428,006
- OSTI ID:
- 1860129
- Country of Publication:
- United States
- Language:
- English
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