Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica

Wang, Ching-Yu; Kwon, Ohhun; Gorte, Raymond J.; Vohs, John M.

doi:10.1016/j.micromeso.2022.111821

Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica

Journal Article · Thu Mar 10 00:00:00 EST 2022 · Microporous and Mesoporous Materials

DOI:https://doi.org/10.1016/j.micromeso.2022.111821· OSTI ID:1848088

Wang, Ching-Yu ^[1]; Kwon, Ohhun ^[2]; Gorte, Raymond J. ^[2]; Vohs, John M. ^[2]

Univ. of Pennsylvania, Philadelphia, PA (United States); University of Pennsylvania
Univ. of Pennsylvania, Philadelphia, PA (United States)

Atomic layer deposition (ALD) was used to prepare ZrO₂ films on the surface of the mesoporous silica, SBA-15, and to modify the surface of these films with WO₃ in order to form tungstated zirconia. Adsorption-desorption isotherms, pore size distributions, and transmission electron microscopy demonstrated that the ALD synthesis produced zirconia films that were conformal to the SBA-15 pores. DRIFT spectroscopy of pyridine adsorbed on the tungstated-zirconia SBA-15 samples showed adsorbed pyridinium ions, confirming the presence of Brønsted-acid sites on this material, consistent with what has been reported for bulk tungstated zirconia. Here, the ALD-synthesized, tungstated-zirconia SBA-15 was also shown to be active in the acid-catalyzed H-D exchange between toluene and D₂O.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of Pennsylvania, Philadelphia, PA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences & Biosciences Division

Grant/Contract Number:: SC0009440

OSTI ID:: 1848088

Alternate ID(s):: OSTI ID: 1854962

Journal Information:: Microporous and Mesoporous Materials, Journal Name: Microporous and Mesoporous Materials Vol. 335; ISSN 1387-1811

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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