Growth of ZrO2 films on mesoporous silica sieve via atomic layer deposition

Rasteiro, Letícia F.; Motin, Md Abdul; Vieira, Luiz H.; Assaf, Elisabete M.; Zaera, Francisco

doi:10.1016/j.tsf.2023.139716

Growth of ZrO₂ films on mesoporous silica sieve via atomic layer deposition

Journal Article · Sat Jan 28 00:00:00 EST 2023 · Thin Solid Films

DOI:https://doi.org/10.1016/j.tsf.2023.139716· OSTI ID:2419615

^[1]; Motin, Md Abdul ^[2]; ^[3]; ^[4]; ^[2]

Univ. of Sao Paulo (Brazil); OSTI
Univ. of California, Riverside, CA (United States)
Federal Univ. of Sao Carlos, Sao Paulo (Brazil)
Univ. of Sao Paulo (Brazil)

The atomic layer deposition of ZrO₂ thin films over the mesopores of a mesoporous silica sieve, SBA-15 (Santa Barbara Amorphous-15), using the tetrakis(dimethylamino)zirconium(IV) (TDMAZ) as ZrO₂ precursor was tested and characterized using N₂ adsorption-desorption isotherms, taking advantage of the well-defined shape and size distribution of the pores in the SBA-15. Three samples were prepared, using 2, 4, and 6 deposition cycles to control the thickness of the films. It was determined that, as the average size of the pores decreased (with the increasing number of cycles), their size distribution remained narrow, indicating a homogeneous distribution of the ZrO₂ throughout the surfaces of the SBA-15 pores. This conclusion was confirmed by transmission electron microscopy and X-ray photoelectron spectroscopy. Further, the deposition rate appears to slow down after 4 cycles, an observation that we explain by different chemisorption properties of TDMAZ molecules over SBA-15 and ZrO₂ surface and by relating the kinetic diameter of TDMAZ with the pore diameter of SBA-15 after 4 deposition cycles: mass transport limitations have become significant at this point. They may be affected by complex factors like electronic effects caused by exposed ZrO₂ surface and the multi-directional adsorption of precursor molecules in the pore walls.

View Accepted Manuscript (DOE)

Research Organization:: Univ. of California, Riverside, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0001839

OSTI ID:: 2419615

Journal Information:: Thin Solid Films, Journal Name: Thin Solid Films Journal Issue: C Vol. 768; ISSN 0040-6090

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

References (25)

Atomic Layer Deposition Chemistry Recent Developments and Future Challenges Leskelä, Markku; Ritala, Mikko Angewandte Chemie International Edition, Vol. 42, Issue 45, p. 5548-5554 https://doi.org/10.1002/anie.200301652	journal	November 2003
Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde Weng, Zhihuan; Zaera, Francisco Topics in Catalysis, Vol. 62, Issue 12-16 https://doi.org/10.1007/s11244-019-01163-4	journal	March 2019
Electronic structure calculations on workstation computers: The program system turbomole Ahlrichs, Reinhart; Bär, Michael; Häser, Marco Chemical Physics Letters, Vol. 162, Issue 3 https://doi.org/10.1016/0009-2614(89)85118-8	journal	October 1989
Application of ZrO2 as a catalyst and a catalyst support Yamaguchi, Tsutomu Catalysis Today, Vol. 20, Issue 2 https://doi.org/10.1016/0920-5861(94)80003-0	journal	June 1994
Classification of Gibbs adsorption isotherms Donohue, M. D.; Aranovich, G. L. Advances in Colloid and Interface Science, Vol. 76-77 https://doi.org/10.1016/S0001-8686(98)00044-X	journal	July 1998
High-surface-area, iron-oxide films prepared by atomic layer deposition on γ-Al2O3 Onn, Tzia Ming; Monai, Matteo; Dai, Sheng Applied Catalysis A: General, Vol. 534 https://doi.org/10.1016/j.apcata.2017.01.025	journal	March 2017
Atomic layer deposition of TiO₂ on mesoporous silica Mahurin, Shannon; Bao, Lili; Yan, Wenfu Journal of Non-Crystalline Solids, Vol. 352, Issue 30-31, p. 3280-3284 https://doi.org/10.1016/j.jnoncrysol.2006.05.008	journal	September 2006
A brief review of atomic layer deposition: from fundamentals to applications Johnson, Richard W.; Hultqvist, Adam; Bent, Stacey F. Materials Today, Vol. 17, Issue 5 https://doi.org/10.1016/j.mattod.2014.04.026	journal	June 2014
Surface structuring of mesoporous materials by controlled synthesis of nanocavities Ruff, Philip; Lauterbach, Stefan; Kleebe, Hans-Joachim Microporous and Mesoporous Materials, Vol. 235 https://doi.org/10.1016/j.micromeso.2016.08.005	journal	November 2016
Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica Wang, Ching-Yu; Kwon, Ohhun; Gorte, Raymond J. Microporous and Mesoporous Materials, Vol. 335 https://doi.org/10.1016/j.micromeso.2022.111821	journal	April 2022
Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities Weber, Matthieu; Julbe, Anne; Ayral, André Chemistry of Materials, Vol. 30, Issue 21 https://doi.org/10.1021/acs.chemmater.8b02687	journal	October 2018
Nucleation and Initial Stages of Growth during the Atomic Layer Deposition of Titanium Oxide on Mesoporous Silica Ke, Wang; Liu, Yang; Wang, Xuelong Nano Letters, Vol. 20, Issue 9 https://doi.org/10.1021/acs.nanolett.0c02990	journal	August 2020
Sub-Monolayer Control of Mixed-Oxide Support Composition in Catalysts via Atomic Layer Deposition: Selective Hydrogenation of Cinnamaldehyde Promoted by (SiO ₂ -ALD)-Pt/Al ₂ O ₃ Weng, Zhihuan; Zaera, Francisco ACS Catalysis, Vol. 8, Issue 9 https://doi.org/10.1021/acscatal.8b02431	journal	August 2018
Atomic Layer Deposition of Yttria-Stabilized Zirconia for Solid Oxide Fuel Cells Shim, Joon Hyung; Chao, Cheng-Chieh; Huang, Hong Chemistry of Materials, Vol. 19, Issue 15 https://doi.org/10.1021/cm070913t	journal	July 2007
Atomic Layer Deposition: An Overview George, Steven M. Chemical Reviews, Vol. 110, Issue 1, p. 111-131 https://doi.org/10.1021/cr900056b	journal	January 2010
Catalyst Design with Atomic Layer Deposition O’Neill, Brandon J.; Jackson, David H. K.; Lee, Jechan ACS Catalysis, Vol. 5, Issue 3 https://doi.org/10.1021/cs501862h	journal	February 2015
Quantum Mechanical Basis for Kinetic Diameters of Small Gaseous Molecules Mehio, Nada; Dai, Sheng; Jiang, De-en The Journal of Physical Chemistry A, Vol. 118, Issue 6 https://doi.org/10.1021/jp412588f	journal	January 2014
Quantification of silanol sites for the most common mesoporous ordered silicas and organosilicas: total versus accessible silanols Ide, Matthias; El-Roz, Mohamad; De Canck, Els Phys. Chem. Chem. Phys., Vol. 15, Issue 2 https://doi.org/10.1039/C2CP42811C	journal	January 2013
Sub-monolayer control of the growth of oxide films on mesoporous materials Weng, Zhihuan; Chen, Zhi-hui; Qin, Xiangdong Journal of Materials Chemistry A, Vol. 6, Issue 36 https://doi.org/10.1039/C8TA05431B	journal	January 2018
Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films Niinistö, Jaakko; Kukli, Kaupo; Kariniemi, Maarit Journal of Materials Chemistry, Vol. 18, Issue 43 https://doi.org/10.1039/b810922b	journal	January 2008
Toward reliable density functional methods without adjustable parameters: The PBE0 model Adamo, Carlo; Barone, Vincenzo The Journal of Chemical Physics, Vol. 110, Issue 13 https://doi.org/10.1063/1.478522	journal	April 1999
Tailoring nanopore formation in atomic layer deposited ultrathin films Karwal, Saurabh; Li, Tao; Yanguas-Gil, Angel Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 36, Issue 1 https://doi.org/10.1116/1.5003360	journal	January 2018
Modification of LSF-YSZ Composite Cathodes by Atomic Layer Deposition Rahmanipour, M.; Cheng, Y.; Onn, T. M. Journal of The Electrochemical Society, Vol. 164, Issue 7 https://doi.org/10.1149/2.0181709jes	journal	January 2017
Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone Liu, Junqing; Li, Junpeng; Wu, Jianzhuo Nanoscale Research Letters, Vol. 14, Issue 1 https://doi.org/10.1186/s11671-019-2989-8	journal	May 2019
Spectroscopic Understanding of SnO2 and WO3 Metal Oxide Surfaces with Advanced Synchrotron Based; XPS-UPS and Near Ambient Pressure (NAP) XPS Surface Sensitive Techniques for Gas Sensor Applications under Operational Conditions Ciftyürek, Engin; Šmíd, Břetislav; Li, Zheshen Sensors, Vol. 19, Issue 21 https://doi.org/10.3390/s19214737	journal	October 2019

Similar Records

Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica

Journal Article · Wed Mar 09 19:00:00 EST 2022 · Microporous and Mesoporous Materials · OSTI ID:1848088

Related Subjects

36 MATERIALS SCIENCE
Adsorption–desorption isotherms
Atomic layer deposition
Mesoporous materials
SBA-15
Zirconium oxide

Growth of ZrO2 films on mesoporous silica sieve via atomic layer deposition

Citation Formats

References (25)

Similar Records

Related Subjects

Growth of ZrO₂ films on mesoporous silica sieve via atomic layer deposition