Repeatability and sensitivity characterization of the far-field high-energy diffraction microscopy instrument at the Advanced Photon Source

Park, Jun-Sang; Sharma, Hemant; Kenesei, Peter

doi:10.1107/S1600577521008286

Title: Repeatability and sensitivity characterization of the far-field high-energy diffraction microscopy instrument at the Advanced Photon Source

Journal Article · Mon Sep 13 00:00:00 EDT 2021 · Journal of Synchrotron Radiation (Online)

DOI:https://doi.org/10.1107/S1600577521008286· OSTI ID:1844816

Park, Jun-Sang; Sharma, Hemant; Kenesei, Peter

In the last two decades, far-field high-energy diffraction microscopy (FF-HEDM) and similar non-destructive techniques have been actively developed at synchrotron light sources around the world. As these techniques (and associated analysis tools) are becoming more available for the general users of these light sources, it is important and timely to characterize their performance and capabilities. In this work, the FF-HEDM instrument implemented at the 1-ID-E endstation of the Advanced Photon Source (APS) is summarized. The set of measurements conducted to characterize the instrument's repeatability and sensitivity to changes in grain orientation and position are also described. When an appropriate grain matching method is used, the FF-HEDM instrument's repeatability is approximately 5 µm in translation, 0.02° in rotation, and 2 × 10 ⁻⁴ in strain; the instrument sensitivity is approximately 5 µm in translation and 0.05° in rotation.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1844816

Alternate ID(s):: OSTI ID: 1841431

Journal Information:: Journal of Synchrotron Radiation (Online), Journal Name: Journal of Synchrotron Radiation (Online) Vol. 28 Journal Issue: 6; ISSN 1600-5775

Publisher:: International Union of Crystallography (IUCr)Copyright Statement

Country of Publication:: Denmark

Language:: English

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