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Density dependence of the excitation gaps in an undoped Si/SiGe double-quantum-well heterostructure

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/5.0068538· OSTI ID:1834119
 [1];  [1];  [2];  [2];  [2];  [3];  [4];  [2];  [3];  [1]
  1. Univ. of Florida, Gainesville, FL (United States)
  2. National Taiwan Univ., Taipei (Taiwan). Graduate Inst. of Electronic Engineering
  3. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  4. National Taiwan Univ., Taipei (Taiwan). Graduate Inst. of Electronic Engineering; Taiwan Semiconductor Research Inst., Hsinchu (Taiwan)

In this work, we report low-temperature magneto-transport measurements of an undoped Si/SiGe asymmetric double quantum well heterostructure. The density in both layers is tuned independently utilizing top and bottom gates, allowing the investigation of quantum wells at both imbalanced and matched densities. Integer quantum Hall states at total filling factor vT=1 and vT=2 are observed in both density regimes, and the evolution of their excitation gaps is reported as a function of the density. The vT=1 gap evolution departs from the behavior generally observed for valley splitting in the single layer regime. Furthermore, by comparing the vT=2 gap to the single particle tunneling energy, ΔSAS, obtained from Schrödinger–Poisson (SP) simulations, evidence for the onset of spontaneous interlayer coherence is observed for a relative filling fraction imbalance smaller than ~50%.

Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF); Ministry of Science and Technology Taiwan (MOST)
Grant/Contract Number:
NA0003525
OSTI ID:
1834119
Report Number(s):
SAND--2021-15149J; 702114
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 119; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

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