Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations

Marks, Samuel D.; Quan, Peiyu; Liu, Rui; Highland, Matthew J.; Zhou, Hua; Kuech, Thomas F.; Stephenson, G. Brian; Evans, Paul G.

doi:10.1063/5.0039196

Title: Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations

Journal Article · Mon Feb 01 00:00:00 EST 2021 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/5.0039196· OSTI ID:1774161

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Univ. of Wisconsin, Madison, WI (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)

Solid-phase epitaxy (SPE) and other three-dimensional epitaxial crystallization processes pose challenging structural and chemical characterization problems. The concentration of defects, the spatial distribution of elastic strain, and the chemical state of ions each vary with nanoscale characteristic length scales and depend sensitively on the gas environment and elastic boundary conditions during growth. The lateral or three-dimensional propagation of crystalline interfaces in SPE has nanoscale or submicrometer characteristic distances during typical crystallization times. Here, an in situ synchrotron hard x-ray instrument allows these features to be studied during deposition and crystallization using diffraction, resonant scattering, nanobeam and coherent diffraction imaging, and reflectivity. The instrument incorporates a compact deposition system allowing the use of short-working-distance x-ray focusing optics. Layers are deposited using radio-frequency magnetron sputtering and evaporation sources. The deposition system provides control of the gas atmosphere and sample temperature. The sample is positioned using a stable mechanical design to minimize vibration and drift and employs precise translation stages to enable nanobeam experiments. Results of in situ x-ray characterization of the amorphous thin film deposition process for a SrTiO₃/BaTiO₃ multilayer illustrate implementation of this instrument.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; National Science Foundation (NSF); USDOE

Grant/Contract Number:: AC02-06CH11357; DMR-1720415

OSTI ID:: 1774161

Alternate ID(s):: OSTI ID: 1765926

Journal Information:: Review of Scientific Instruments, Vol. 92, Issue 2; ISSN 0034-6748

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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47 OTHER INSTRUMENTATION
x-ray instruments
crystallization
coherence imaging
x-ray microscopy
thin film deposition
synchrotrons
epitaxy
materials analysis
hard x-rays
magnetron sputtering

Title: Instrument for in situ hard x-ray nanobeam characterization during epitaxial crystallization and materials transformations

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