New inductively coupled plasma source using a multispiral coil
Journal Article
·
· Review of Scientific Instruments
- Thin Film Process Laboratory, Matsushita Electric Industrial Co., Ltd., 2-7 Matsuba-cho, Kadoma, Osaka 571 (Japan)
The authors have developed a new inductively coupled plasma source (ICPS), using a multispiral coil with 1/3 the inductance of the conventional ICPS coil. This source can produce plasma of 10{sup 11} cm{sup {minus}3} or higher density with {plus_minus}5% fluctuation, at pressures below 10 mTorr. {copyright} {ital 1995} {ital American} {ital Institute} {ital of} {ital Physics}.
- OSTI ID:
- 172253
- Journal Information:
- Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 11 Vol. 66; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
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