Ion deposition by inductively coupled plasma mass spectrometry
Journal Article
·
· Journal of Vacuum Science and Technology, A
- Ames Laboratory--U. S. Department of Energy, Department of Chemistry, Iowa State University, Ames, Iowa 50011 (United States)
An atmospheric pressure inductively coupled plasma (ICP) is used with a quadrupole mass spectrometer (MS) for ion deposition. The deposited element is introduced as a nebulized aqueous solution. Modifications to the ICP-MS device allow generation and deposition of a mass-resolved beam of {sup 165}Ho{sup +} at 5{times}10{sup 12} ions s{sup {minus}1}. The ICP is a universal, multielement ion source that can potentially be used for applications such as deposition of mixtures of widely varying stoichiometry or of alternating layers of different elements. {copyright} {ital 1996 American Vacuum Society}
- OSTI ID:
- 278954
- Journal Information:
- Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 2 Vol. 14; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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