Focused Electron Beam-Based 3D Nanoprinting for Scanning Probe Microscopy: A Review

Plank, Harald; Winkler, Robert; Schwalb, Christian H.; Hütner, Johanna; Fowlkes, Jason D.; Rack, Philip D.; Utke, Ivo; Huth, Michael

doi:10.3390/mi11010048

Title: Focused Electron Beam-Based 3D Nanoprinting for Scanning Probe Microscopy: A Review

Journal Article · Mon Dec 30 00:00:00 EST 2019 · Micromachines

DOI:https://doi.org/10.3390/mi11010048· OSTI ID:1628463

^[1];

^[2]; Schwalb, Christian H. ^[3]; Hütner, Johanna ^[3];

^[4];

^[4]; Utke, Ivo ^[5];

^[6]

Graz Univ. of Technology (Austria). Inst. of Electron Microscopy and Nanoalnalysis. Christian Doppler Lab. for Direct-Write Fabrication of 3D Nano-Probes (DEFINE); Graz Univ. of Technology (Austria). Inst. of Electron Microscopy and Nanoanalysis; Graz Centre for Electron Microscopy, Graz (Austria)
Graz Univ. of Technology (Austria). Inst. of Electron Microscopy and Nanoalnalysis. Christian Doppler Lab. for Direct-Write Fabrication of 3D Nano-Probes (DEFINE)
GETec Microscopy GmbH, Vienna (Austria)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS); Univ. of Tennessee, Knoxville, TN (United States). Materials Science and Engineering
Empa-Swiss Federal Labs for Materials Science and Technology, Thun (Switzerland). Mechanics of Materials and Nanostructures Lab.
Goethe Univ., Frankfurt (Germany). Physics Inst.

Scanning probe microscopy (SPM) has become an essential surface characterization technique in research and development. By concept, SPM performance crucially depends on the quality of the nano-probe element, in particular, the apex radius. Now, with the development of advanced SPM modes beyond morphology mapping, new challenges have emerged regarding the design, morphology, function, and reliability of nano-probes. To tackle these challenges, versatile fabrication methods for precise nano-fabrication are needed. Aside from well-established technologies for SPM nano-probe fabrication, focused electron beam-induced deposition (FEBID) has become increasingly relevant in recent years, with the demonstration of controlled 3D nanoscale deposition and tailored deposit chemistry. Moreover, FEBID is compatible with practically any given surface morphology. In this review article, we introduce the technology, with a focus on the most relevant demands (shapes, feature size, materials and functionalities, substrate demands, and scalability), discuss the opportunities and challenges, and rationalize how those can be useful for advanced SPM applications. As will be shown, FEBID is an ideal tool for fabrication/modification and rapid prototyping of SPM-tipswith the potential to scale up industrially relevant manufacturing.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1628463

Alternate ID(s):: OSTI ID: 1761729

Journal Information:: Micromachines, Vol. 11, Issue 1; ISSN 2072-666X

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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Advanced photolithographic mask repair using electron beams Liang, Ted; Frendberg, Eric; Lieberman, Barry Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, Issue 6 https://doi.org/10.1116/1.2062428	journal	January 2005
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Dielectric sensing by charging energy modulation in a nano-granular metal Huth, Michael; Kolb, Florian; Plank, Harald arXiv https://doi.org/10.48550/arxiv.1404.3541	text	January 2014
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