Lanthanum Gadolinium Oxide: A New Electronic Device Material for CMOS Logic and Memory Devices
- Univ. of Puerto Rico, San Juan, PR (United States). Dept. of Physics; DOE/OSTI
- Univ. of Puerto Rico, San Juan, PR (United States). Dept. of Physics; Univ. of Cambridge (United Kingdom). Cavendish Lab. Dept. of Physics
- Univ. of Puerto Rico, San Juan, PR (United States). Dept. of Physics
A comprehensive study on the ternary dielectric, LaGdO3, synthesized and qualified in our laboratory as a novel high-k dielectric material for logic and memory device applications in terms of its excellent features that include a high linear dielectric constant (k) of ~22 and a large energy bandgap of ~5.6 eV, resulting in sufficient electron and hole band offsets of ~2.57 eV and ~1.91 eV, respectively, on silicon, good thermal stability with Si and lower gate leakage current densities within the International Technology Roadmap for Semiconductors (ITRS) specified limits at the sub-nanometer electrical functional thickness level, which are desirable for advanced complementary metal-oxide-semiconductor (CMOS), bipolar (Bi) and BiCMOS chips applications, is presented in this review article.
- Research Organization:
- Univ. of Puerto Rico, San Juan, PR (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- FG02-08ER46526
- OSTI ID:
- 1628445
- Journal Information:
- Materials, Journal Name: Materials Journal Issue: 4 Vol. 7; ISSN 1996-1944; ISSN MATEG9
- Publisher:
- MDPICopyright Statement
- Country of Publication:
- United States
- Language:
- English
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