Safe and low temperature thermite reaction systems and method to form porous silicon
Patent
·
OSTI ID:1568140
Embodiments of a safe, low-temperature reaction system and method for preparing porous silicon are disclosed. The porous silicon is prepared from porous silica, a low-melting metal halide, and a metal comprising aluminum, magnesium, or a combination thereof. Advantageously, embodiments of the disclosed methods can be performed at temperatures ≤400° C. Silicon produced by the disclosed methods has a porosity that is equal to or greater than the porous silica precursor. The porous silicon is suitable for use in electrodes.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-76RL01830
- Assignee:
- Battelle Memorial Institute (Richland, WA)
- Patent Number(s):
- 10,246,337
- Application Number:
- 15/436,027
- OSTI ID:
- 1568140
- Country of Publication:
- United States
- Language:
- English
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