Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Gallagher, J. C.; Meng, K. Y.; Brangham, J. T.; Wang, H. L.; Esser, B. D.; McComb, D. W.; Yang, F. Y.

doi:10.1103/physrevlett.118.027201

Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Journal Article · Sun Jan 01 04:00:00 EST 2017 · Physical Review Letters

DOI:https://doi.org/10.1103/physrevlett.118.027201· OSTI ID:1536470

Gallagher, J. C. ^[1]; Meng, K. Y.; Brangham, J. T.; Wang, H. L.; Esser, B. D.; McComb, D. W.; Yang, F. Y.

DOE/OSTI

Not provided.

Research Organization:: The Ohio State Univ., Columbus, OH (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: SC0001304

OSTI ID:: 1536470

Journal Information:: Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 2 Vol. 118; ISSN 0031-9007; ISSN PRLTAO

Publisher:: American Physical Society (APS)

Country of Publication:: United States

Language:: English

References (24)

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