Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Gallagher, J. C.; Meng, K. Y.; Brangham, J. T.; Wang, H. L.; Esser, B. D.; McComb, D. W.; Yang, F. Y.

doi:10.1103/PhysRevLett.118.027201

Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Journal Article · Mon Jan 09 00:00:00 EST 2017 · Physical Review Letters

DOI:https://doi.org/10.1103/PhysRevLett.118.027201· OSTI ID:1338662

Gallagher, J. C.; Meng, K. Y.; Brangham, J. T.; Wang, H. L.; Esser, B. D.; McComb, D. W.; Yang, F. Y.

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View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0001304

OSTI ID:: 1338662

Alternate ID(s):: OSTI ID: 1536470

Journal Information:: Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 2 Vol. 118; ISSN 0031-9007; ISSN PRLTAO

Publisher:: American Physical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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