REDUCTION OF RESISTIVITY IN CU THIN FILMS BY PARTIAL OXIDIATION: MICROSTRUCTURAL MECHANISMS
No abstract prepared.
- Research Organization:
- Brookhaven National Laboratory, National Synchrotron Light Source (US)
- Sponsoring Organization:
- DOE/OFFICE OF SCIENCE (US)
- DOE Contract Number:
- AC02-98CH10886
- OSTI ID:
- 15015733
- Report Number(s):
- BNL--74522-2005-JA
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 84; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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