TEXTURE AND RESISTIVITY OF DILUTE BINARY CU(AL), CU(IN), CU(TI), CU(NB), CU(IR), AND CU(W) ALLOY THIN FILMS

Journal Article · Mon Dec 31 23:00:00 EST 2001 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.1520549· OSTI ID:15008564

GUNGOR, A; BARMAK, K; ROLLETT, A; HARPER, J

No abstract prepared.

• Research Organization: Brookhaven National Laboratory, National Synchrotron Light Source (US)
• Sponsoring Organization: DOE/OFFICE OF SCIENCE (US)
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 15008564
• Report Number(s): BNL--72873-2004-JA
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 6 Vol. 20
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
BINARY ALLOY SYSTEMS
COPPER ALLOYS
ELECTRIC CONDUCTIVITY
INDIUM ALLOYS
IRIDIUM ALLOYS
NATIONAL SYNCHROTRON LIGHT SOURCE
NIOBIUM ALLOYS
TEXTURE
THIN FILMS
TITANIUM ALLOYS
TUNGSTEN ALLOYS