Nanometer precision metrology of submicron Cu/SiO{sub 2} interconnects using fluorescence and transmission x-ray microscopy.
No abstract prepared.
- Research Organization:
- Advanced Photon Source, Argonne National Lab., IL (US); Univ. of Chicago (US); IBM T.J. Watson Research Center (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 15005496
- Journal Information:
- J. Appl. Phys., Vol. 94, Issue 9; Other Information: PBD: [2003]; Related Information: Nov. 1, 2003
- Country of Publication:
- United States
- Language:
- English
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