Quantitative nanoscale metrology study of Cu/SiO{sub 2} interconnect technology using transmission x-ray microscopy.
No abstract prepared.
- Research Organization:
- Advanced Photon Source, Argonne National Lab., IL (US); Univ. of Chicago; IBM T. J. Watson Research Center (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 15002837
- Journal Information:
- Applied Physics Letters, Vol. 77, Issue 21; Other Information: PBD: 20 Nov 2000; Related Information: Nov. 20, 2000
- Country of Publication:
- United States
- Language:
- English
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