Quantitative metrology study of Cu/SiO{sub 2} interconnect structures using fluorescence x-ray microscopy.
No abstract prepared.
- Research Organization:
- Advanced Photon Source, Argonne National Lab., IL (US); Univ. of Chicago; IBM T. J. Watson Research Center (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 15002593
- Journal Information:
- Applied Physics Letters, Vol. 78, Issue 6; Other Information: PBD: 5 Feb 2001; Related Information: Feb. 5, 2001; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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