X-ray scattering studies of surfactant mediated epitaxial growth of Si/Ge/Si (001) heterostructures.
Journal Article
·
· Journal of Applied Physics
No abstract prepared.
- Research Organization:
- Advanced Photon Source, Argonne National Lab., IL (US); Northwestern Univ. (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 15002941
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 5 Vol. 88
- Country of Publication:
- United States
- Language:
- English
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