Atomically Abrupt Topological p–n Junction
- Inst. for Basic Science, Pohang (Korea, Republic of); Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of)
- Univ. of Utah, Salt Lake City, UT (United States)
- Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of). Dept. of Physics
- Pohang Univ. of Science and Technology (POSTECH) (Korea, Republic of). Pohang Accelerator Lab.
- Univ. of Utah, Salt Lake City, UT (United States); Collaborative Innovation Center of Quantum Matter, Beijing (China)
Topological insulators (TI’s) are a new class of quantum matter with extraordinary surface electronic states, which bear great potential for spintronics and error-tolerant quantum computing. In order to put a TI into any practical use, these materials need to be fabricated into devices whose basic units are often p–n junctions. Interesting electronic properties of a ‘topological’ p–n junction were proposed theoretically such as the junction electronic state and the spin rectification. However, the fabrication of a lateral topological p–n junction has been challenging because of materials, process, and fundamental reasons. Here, we demonstrate an innovative approach to realize a p–n junction of topological surface states (TSS’s) of a three-dimensional (3D) topological insulator (TI) with an atomically abrupt interface. When a ultrathin Sb film is grown on a 3D TI of Bi2Se3 with a typical n-type TSS, the surface develops a strongly p-type TSS through the substantial hybridization between the 2D Sb film and the Bi2Se3 surface. Thus, the Bi2Se3 surface covered partially with Sb films bifurcates into areas of n- and p-type TSS’s as separated by atomic step edges with a lateral electronic junction of as short as 2 nm. This approach opens a different avenue toward various electronic and spintronic devices based on well-defined topological p–n junctions with the scalability down to atomic dimensions.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). National Energy Research Scientific Computing Center (NERSC)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- FG02-04ER46148
- OSTI ID:
- 1487451
- Journal Information:
- ACS Nano, Journal Name: ACS Nano Journal Issue: 10 Vol. 11; ISSN 1936-0851
- Publisher:
- American Chemical Society (ACS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
A 2D nonsymmorphic Dirac semimetal in a chemically modified group-VA monolayer with a black phosphorene structure
|
journal | January 2019 |
Anisotropic electronic structure of antimonene
|
journal | November 2019 |
Recovery of surface state bands after desorption of Te capping layer on (Bi 1− x Sb x ) 2 Te 3 ternary topological insulators
|
journal | September 2019 |
Fabry–Perot interferometry in Weyl semi-metals
|
journal | December 2018 |
Spintronic signatures of Klein tunneling in topological insulators
|
journal | November 2017 |
Similar Records
Molecular beam epitaxial growth of Bi{sub 2}Te{sub 3} and Sb{sub 2}Te{sub 3} topological insulators on GaAs (111) substrates: a potential route to fabricate topological insulator p-n junction
Large bilinear magnetoresistance from Rashba spin-splitting on the surface of a topological insulator
Tuning the vertical location of helical surface states in topological insulator heterostructures via dual-proximity effects
Journal Article
·
Mon Jul 15 00:00:00 EDT 2013
· AIP Advances
·
OSTI ID:22220491
Large bilinear magnetoresistance from Rashba spin-splitting on the surface of a topological insulator
Journal Article
·
Tue Dec 06 19:00:00 EST 2022
· Physical Review. B
·
OSTI ID:2420499
Tuning the vertical location of helical surface states in topological insulator heterostructures via dual-proximity effects
Journal Article
·
Tue Feb 05 19:00:00 EST 2013
· Scientific Reports
·
OSTI ID:1624588