Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

Journal Article · Wed Nov 01 04:00:00 EST 1995 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.588248· OSTI ID:146696

Wendt, J R; Vawter, G A; Smith, R E; Warren, M E ^[1]

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1. Sandia National Laboratories, Albuquerque, New Mexico 87185-0603 (United States)

A single-etch-step process for the fabrication of high-efficiency diffractive optical elements is presented. The technique uses subwavelength surface relief structures to create a material with an effective index of refraction determined by the fill factor of the binary pattern. Fabrication is performed using electron beam lithography and reactive-ion-beam etching on bulk GaAs, but the process is applicable to any material for which well-controlled etches exist. In this work, we designed and fabricated a blazed transmission grating for operation at 975 nm. The blazed grating exhibits a diffraction efficiency into the first order of 85% of the transmitted power. {copyright} {ital 1995} {ital American} {ital Vacuum} {ital Society}

• Research Organization: Sandia National Laboratory
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 146696
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 13; ISSN JVTBD9; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DIFFRACTION GRATINGS
ELECTRON BEAMS
ETCHING
FABRICATION
GALLIUM ARSENIDES
INFRARED RADIATION
ION BEAMS