Oxidant K edge x-ray emission spectroscopy of UF₄ and UO₂

Journal Article · Wed Jan 31 00:00:00 EST 2018 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.5016393· OSTI ID:1435130

Tobin, J. G. ^[1]; Yu, S. -W. ^[2]; Qiao, R. ^[3]; Yang, W. L. ^[3]; Shuh, D. K. ^[3]

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1. Univ. of Wisconsin, Oshkosh, WI (United States). Dept. of Physics and Astronomy
2. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences, and Biosciences Division
• Grant/Contract Number: AC02-05CH11231; AC52-07NA27344
• OSTI ID: 1435130
• Alternate ID(s): OSTI ID: 1418862; OSTI ID: 1458631
• Report Number(s): LLNL-JRNL-742730; ark:/13030/qt3q7977vp; TRN: US1802701
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 36, Issue 3; ISSN 0734-2101
• Publisher: American Vacuum Society
• Country of Publication: United States
• Language: English

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