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Title: Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography

Abstract

In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.

Authors:
 [1];  [2];  [3];  [4];  [5]
+ Show Author Affiliations
  1. Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering; Sandia National Lab. (SNL-CA), Livermore, CA (United States)
  2. Sandia National Lab. (SNL-CA), Livermore, CA (United States); Xradia, Inc., Concord, CA (United States)
  3. Sandia National Lab. (SNL-CA), Livermore, CA (United States)
  4. Stanford Univ., CA (United States). Department of Electrical Engineering
  5. Berkeley Sensor and Actuator Center, Berkeley, CA (United States); Univ. of California, Davis, CA (United States). Department of Mechanical and Aeronautical Engineering
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1426959
Report Number(s):
SAND-2007-1398J
Journal ID: ISSN 1536-125X; 526793
Grant/Contract Number:  
AC04-94AL85000
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
IEEE Transactions on Nanotechnology
Additional Journal Information:
Journal Volume: 7; Journal Issue: 5; Journal ID: ISSN 1536-125X
Publisher:
IEEE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; surface plasmons (SPs); Nanoimprint lithography (NIL); nanotechnology; refractive index measurement; subwavelength optics

Citation Formats

Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography. United States: N. p., 2008. Web. doi:10.1109/TNANO.2008.2002648.
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Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., & Horsley, D. A. Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography. United States. https://doi.org/10.1109/TNANO.2008.2002648
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Skinner, J. L., Hunter, L. L., Talin, A. A., Provine, J., and Horsley, D. A. 2008. "Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography". United States. https://doi.org/10.1109/TNANO.2008.2002648. https://www.osti.gov/servlets/purl/1426959.
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@article{osti_1426959,
title = {Large-Area Subwavelength Aperture Arrays Fabricated Using Nanoimprint Lithography},
author = {Skinner, J. L. and Hunter, L. L. and Talin, A. A. and Provine, J. and Horsley, D. A.},
abstractNote = {In this paper, we report on the fabrication and characterization of large-area 2-D square arrays of subwavelength holes in Ag and Al films. Fabrication is based on thermal nanoimprint lithography and metal evaporation, without the need for etching, and is compatible with low-cost, large-scale production. Reflectance spectra for these arrays display an intensity minimum whose amplitude, center wavelength, and line width depend on the geometry of the array and the reflectivity of the metal film. By placing various fluids in contact with the subwavelength aperture arrays, we observe that the center wavelength of the reflectance minimum varies linearly with the refractive index of the fluid with a sensitivity of over 500 nm per refractive index unit. Lastly, the surface plasmon theory is used to predict sensitivities to refractive index change with accuracies better than 0.5%.},
doi = {10.1109/TNANO.2008.2002648},
url = {https://www.osti.gov/biblio/1426959}, journal = {IEEE Transactions on Nanotechnology},
issn = {1536-125X},
number = 5,
volume = 7,
place = {United States},
year = {Tue Jul 29 00:00:00 EDT 2008},
month = {Tue Jul 29 00:00:00 EDT 2008}
}
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Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1109/TNANO.2008.2002648
Copyright Statement
Other availability
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Figures / Tables:

Fig. 1 Fig. 1: Scanning electron micrograph of (left) Ag and (right) Al gratings fabricated using thermal NIL and shadow evaporation. Hole periodicity and diameter are 500 nm and 110 nm, respectively.
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Works referencing / citing this record:

Highly Sensitive Aluminum-Based Biosensors using Tailorable Fano Resonances in Capped Nanostructures
journal, March 2017

Plasmonic components fabrication via nanoimprint
journal, September 2009

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    Figures / Tables found in this record:

    Fig. 1(p. 2)figure
    Fig. 1(p. 2)figure
    Fig. 2(p. 3)figure
    Fig. 3(p. 3)figure
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      Figures/Tables have been extracted from DOE-funded journal article accepted manuscripts.

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