Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

Li, W.; Urbanski, L.; Marconi, M. C.

doi:10.1063/1.4937899

Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

Journal Article · Mon Dec 28 00:00:00 EST 2015 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4937899· OSTI ID:1421254

Li, W.; Urbanski, L.; Marconi, M. C.

Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-98CH10886

OSTI ID:: 1421254

Journal Information:: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 12 Vol. 86; ISSN 0034-6748

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

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