Chemical vapor deposition of fluorinated polymers
- Rensselaer Polytechnic Institute, Troy, NY (United States)
An overview of the authors` work directed toward the deposition of fluorinated polymers by condensation of thermally or photochemically generated intermediates directly from the vapor state will be presented. Previously known materials such as Teflon AF{reg_sign} and Parylene AF{sub 4} have been successfully deposited and are being evaluated for microelectronic application as on-chip dielectrics. A novel, one-step route to Parylene AF{sub 4} will be described which obviates the necessity of multistep organic synthesis to prepare precursors. A new, partially fluorinated parylene obtained from tetrafluoro-p-xylene will be described. It has also been observed that ultraviolet irradiation of the vapor of dimethyl tetrafluorobenzocyclobutene causes the deposition of an insoluble film which contains fluorine.
- OSTI ID:
- 141636
- Report Number(s):
- CONF-930304--
- Country of Publication:
- United States
- Language:
- English
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