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U.S. Department of Energy
Office of Scientific and Technical Information

Techniques for producing free-standing thin films on frames

Conference ·
OSTI ID:10191075

The procedures of vapor-deposition polymerization, spin coating and orientation-dependent etching have been employed to make free-standing thin films of Parylene-N, Parylene-D, polystyrene, polycarbonate and perfluoro-dimethyl-dioxole/tetrafluoroethylene copolymer (Teflon{reg_sign} AF-1600). The polymeric materials were vapor-deposited or spin-coated onto substrates of polished single-crystal silicon (wafers) and removed on frames of various shapes and sizes after application of adhesive and an etching process using potassium hydroxide. Thicknesses range from 2000{Angstrom} to 12000{Angstrom}.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
10191075
Report Number(s):
SAND--93-0998C; CONF-9305283--1; ON: DE93041144
Country of Publication:
United States
Language:
English