Atomic Layer Deposition of Aluminum Sulfide: Growth Mechanism and Electrochemical Evaluation in Lithium-Ion Batteries

Meng, Xiangbo; Cao, Yanqiang; Libera, Joseph A.; Elam, Jeffrey W.

doi:10.1021/acs.chemmater.7b02175

Title: Atomic Layer Deposition of Aluminum Sulfide: Growth Mechanism and Electrochemical Evaluation in Lithium-Ion Batteries

Journal Article · Sun Oct 01 00:00:00 EDT 2017 · Chemistry of Materials

DOI:https://doi.org/10.1021/acs.chemmater.7b02175· OSTI ID:1415984

^[1]; Cao, Yanqiang ^[2]; Libera, Joseph A. ^[2];

^[2]

Univ. of Arkansas, Fayetteville, AR (United States). Department of Mechanical Engineering
Argonne National Lab. (ANL), Argonne, IL (United States). Energy Systems

This work describes the synthesis of aluminum sulfide (AlS_x) thin films by atomic layer deposition (ALD) using tris(dimethylamido)aluminum and hydrogen sulfide. We employed a suite of in situ measurement techniques to explore the ALD AlS_x growth mechanism, including quartz crystal microbalance, quadrupole mass spectrometry, and Fourier transform infrared spectroscopy. A variety of ex situ characterization techniques were used to determine the growth characteristics, morphology, elemental composition, and crystallinity of the resultant AlS_x films. This study revealed that the AlS_x growth was self-limiting in the temperature range 100–250 °C, and the growth per cycle decreased linearly with increasing temperature from ~0.45 Å/cycle at 100 °C to ~0.1 Å/cycle at 250 °C. The AlSx films were amorphous in this temperature range. We conducted electrochemical testing to evaluate the ALD AlS_x as a potential anode material for lithium-ion batteries (LIBs). Finally, the ALD AlS_x exhibited reliable cyclability over 60 discharge–charge cycles with a sustainable discharge capacity of 640 mAh/g at a current density of 100 mA/g in the voltage window of 0.6–3.5 V.

View Accepted Manuscript (DOE)

Cite

Export

Save

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States); Energy Frontier Research Centers (EFRC) (United States). Center for Electrical Energy Storage (CEES)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1415984

Journal Information:: Chemistry of Materials, Vol. 29, Issue 21; ISSN 0897-4756

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

Citation Metrics:

Cited by: 33 works

Citation information provided by
Web of Science

References (71)

Metal sulfide nanostructures: synthesis, properties and applications in energy conversion and storage Lai, Chen-Ho; Lu, Ming-Yen; Chen, Lih-Juann J. Mater. Chem., Vol. 22, Issue 1 https://doi.org/10.1039/C1JM13879K	journal	January 2012
Unsupported transition metal sulfide catalysts: From fundamentals to industrial application Eijsbouts, S.; Mayo, S. W.; Fujita, K. Applied Catalysis A: General, Vol. 322 https://doi.org/10.1016/j.apcata.2007.01.008	journal	April 2007
Catalytic Properties of Single Layers of Transition Metal Sulfide Catalytic Materials Chianelli, Russell R.; Siadati, Mohammad H.; De la Rosa, Myriam Perez Catalysis Reviews, Vol. 48, Issue 1, p. 1-41 https://doi.org/10.1080/01614940500439776	journal	January 2006
Beyond Intercalation-Based Li-Ion Batteries: The State of the Art and Challenges of Electrode Materials Reacting Through Conversion Reactions Cabana, Jordi; Monconduit, Laure; Larcher, Dominique Advanced Materials, Vol. 22, Issue 35 https://doi.org/10.1002/adma.201000717	journal	August 2010
Gallium Sulfide-Single-Walled Carbon Nanotube Composites: High-Performance Anodes for Lithium-Ion Batteries Meng, Xiangbo; He, Kai; Su, Dong Advanced Functional Materials, Vol. 24, Issue 34 https://doi.org/10.1002/adfm.201401002	journal	July 2014
Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide Meng, Xiangbo; Libera, Joseph A.; Fister, Timothy T. Chemistry of Materials, Vol. 26, Issue 2 https://doi.org/10.1021/cm4031057	journal	December 2013
Atomic Layer Deposition of Metal Sulfide Materials Dasgupta, Neil P.; Meng, Xiangbo; Elam, Jeffrey W. Accounts of Chemical Research, Vol. 48, Issue 2, p. 341-348 https://doi.org/10.1021/ar500360d	journal	January 2015
Tunable core-shell single-walled carbon nanotube-Cu2S networked nanocomposites as high-performance cathodes for lithium-ion batteries Meng, Xiangbo; Riha, Shannon C.; Libera, Joseph A. Journal of Power Sources, Vol. 280 https://doi.org/10.1016/j.jpowsour.2015.01.151	journal	April 2015
Atomic Layer Deposition of MnS: Phase Control and Electrochemical Applications Riha, Shannon C.; Koegel, Alexandra A.; Meng, Xiangbo ACS Applied Materials & Interfaces, Vol. 8, Issue 4 https://doi.org/10.1021/acsami.5b11075	journal	January 2016
Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology Meng, Xiangbo; Wang, Xinwei; Geng, Dongsheng Materials Horizons, Vol. 4, Issue 2 https://doi.org/10.1039/C6MH00521G	journal	January 2017
(Invited) Atomic Layer Deposition of Nanophase Materials for Electrical Energy Storage Meng, X.; Elam, J. W. ECS Transactions, Vol. 69, Issue 7 https://doi.org/10.1149/06907.0039ecst	journal	September 2015
Two-dimensional MoS2: Properties, preparation, and applications Li, Xiao; Zhu, Hongwei Journal of Materiomics, Vol. 1, Issue 1 https://doi.org/10.1016/j.jmat.2015.03.003	journal	March 2015
Controlled synthesis of transition metal dichalcogenide thin films for electronic applications Gatensby, Riley; McEvoy, Niall; Lee, Kangho Applied Surface Science, Vol. 297 https://doi.org/10.1016/j.apsusc.2014.01.103	journal	April 2014
Growth, Optical and Structural Characterization of Layered GaS Films Prepared by Reactive RF Sputtering Method Ohyama, Masanori; Ito, Hiroshi; Takeuchi, Manabu Japanese Journal of Applied Physics, Vol. 44, Issue 7A, p. 4780-4783 https://doi.org/10.1143/JJAP.44.4780	journal	July 2005
Characterization of molecular beam epitaxy grown GaS film for GaAs surface passivation Okamoto, Naoya; Tanaka, Hitoshi Materials Science in Semiconductor Processing, Vol. 2, Issue 1 https://doi.org/10.1016/S1369-8001(98)00051-1	journal	April 1999
Gallium sulfide thin film grown on GaAs(1 0 0) by microwave glow discharge Chen, Xi-ying; Hou, Xiao-yuan; Cao, Xian-an Journal of Crystal Growth, Vol. 173, Issue 1-2, p. 51-56 https://doi.org/10.1016/S0022-0248(96)00808-1	journal	March 1997
Atomic layer deposition of aluminum sulfide thin films using trimethylaluminum and hydrogen sulfide Sinha, Soumyadeep; Mahuli, Neha; Sarkar, Shaibal K. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 1 https://doi.org/10.1116/1.4903951	journal	January 2015
Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition Knez, M.; Nielsch, K.; Niinistö, L. Advanced Materials, Vol. 19, Issue 21, p. 3425-3438 https://doi.org/10.1002/adma.200700079	journal	November 2007
Atomic Layer Deposition: An Overview George, Steven M. Chemical Reviews, Vol. 110, Issue 1, p. 111-131 https://doi.org/10.1021/cr900056b	journal	January 2010
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process Puurunen, Riikka L. Journal of Applied Physics, Vol. 97, Issue 12, Article No. 121301 https://doi.org/10.1063/1.1940727	journal	June 2005
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko Journal of Applied Physics, Vol. 113, Issue 2, Article No. 021301 https://doi.org/10.1063/1.4757907	journal	January 2013
Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications Marichy, Catherine; Bechelany, Mikhael; Pinna, Nicola Advanced Materials, Vol. 24, Issue 8, p. 1017-1032 https://doi.org/10.1002/adma.201104129	journal	January 2012
Emerging Applications of Atomic Layer Deposition for Lithium-Ion Battery Studies Meng, Xiangbo; Yang, Xiao-Qing; Sun, Xueliang Advanced Materials, Vol. 24, Issue 27 https://doi.org/10.1002/adma.201200397	journal	June 2012
Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing van Delft, J. A.; Garcia-Alonso, D.; Kessels, W. M. M. Semiconductor Science and Technology, Vol. 27, Issue 7 https://doi.org/10.1088/0268-1242/27/7/074002	journal	June 2012
Ultrathin Lithium-Ion Conducting Coatings for Increased Interfacial Stability in High Voltage Lithium-Ion Batteries Park, Joong Sun; Meng, Xiangbo; Elam, Jeffrey W. Chemistry of Materials, Vol. 26, Issue 10 https://doi.org/10.1021/cm500512n	journal	May 2014
Towards high-energy and durable lithium-ion batteries via atomic layer deposition: elegantly atomic-scale material design and surface modification Meng, Xiangbo Nanotechnology, Vol. 26, Issue 2 https://doi.org/10.1088/0957-4484/26/2/020501	journal	December 2014
Atomic-scale surface modifications and novel electrode designs for high-performance sodium-ion batteries via atomic layer deposition Meng, Xiangbo Journal of Materials Chemistry A, Vol. 5, Issue 21 https://doi.org/10.1039/C7TA02742G	journal	January 2017
High‐Performance High‐Loading Lithium–Sulfur Batteries by Low Temperature Atomic Layer Deposition of Aluminum Oxide on Nanophase S Cathodes Meng, Xiangbo; Liu, Yuzi; Cao, Yanqiang Advanced Materials Interfaces, Vol. 4, Issue 17 https://doi.org/10.1002/admi.201700096	journal	May 2017
Coking- and Sintering-Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition Lu, Junling; Fu, Baosong; Kung, Mayfair C. Science, Vol. 335, Issue 6073 https://doi.org/10.1126/science.1212906	journal	March 2012
Atomic layer deposition: medical and biological applications Skoog, S. A.; Elam, J. W.; Narayan, R. J. International Materials Reviews, Vol. 58, Issue 2 https://doi.org/10.1179/1743280412Y.0000000009	journal	February 2013
Atomic layer deposition: A versatile technique for plasmonics and nanobiotechnology Im, Hyungsoon; Wittenberg, Nathan J.; Lindquist, Nathan C. Journal of Materials Research, Vol. 27, Issue 4 https://doi.org/10.1557/jmr.2011.434	journal	January 2012
ALD tungsten NEMS switches and tunneling devices Davidson, B. D.; Seghete, D.; George, S. M. Sensors and Actuators A: Physical, Vol. 166, Issue 2 https://doi.org/10.1016/j.sna.2009.07.022	journal	April 2011
Tailoring nanoporous materials by atomic layer deposition Detavernier, Christophe; Dendooven, Jolien; Pulinthanathu Sree, Sreeprasanth Chemical Society Reviews, Vol. 40, Issue 11 https://doi.org/10.1039/c1cs15091j	journal	January 2011
Atomic Layer Epitaxy Suntola, Tuomo; Hyvarinen, Jaakko Annual Review of Materials Science, Vol. 15, Issue 1 https://doi.org/10.1146/annurev.ms.15.080185.001141	journal	August 1985
Atomic layer epitaxy Suntola, Tuomo Materials Science Reports, Vol. 4, Issue 5 https://doi.org/10.1016/S0920-2307(89)80006-4	journal	January 1989
Molecular Level Insights into Atomic Layer Deposition of CdS by Quantum Chemical Calculations Tanskanen, Jukka T.; Bakke, Jonathan R.; Bent, Stacey F. The Journal of Physical Chemistry C, Vol. 114, Issue 39 https://doi.org/10.1021/jp105911p	journal	September 2010
AFM studies of polycrystalline calcium sulfide thin films grown by atomic layer deposition Dey, Srijata; Yun, Sun Jin Applied Surface Science, Vol. 143, Issue 1-4 https://doi.org/10.1016/S0169-4332(98)00624-2	journal	April 1999
Atomic Layer Deposition of SrS and BaS Thin Films Using Cyclopentadienyl Precursors Ihanus, J.; Hänninen, T.; Hatanpää, T. Chemistry of Materials, Vol. 14, Issue 5 https://doi.org/10.1021/cm0111130	journal	May 2002
Atomic layer deposition of Cu2S for future application in photovoltaics Martinson, Alex B. F.; Elam, Jeffrey W.; Pellin, Michael J. Applied Physics Letters, Vol. 94, Issue 12 https://doi.org/10.1063/1.3094131	journal	March 2009
In ₂ S ₃ Atomic Layer Deposition and Its Application as a Sensitizer on TiO ₂ Nanotube Arrays for Solar Energy Conversion Sarkar, Shaibal K.; Kim, Jin Young; Goldstein, David N. The Journal of Physical Chemistry C, Vol. 114, Issue 17 https://doi.org/10.1021/jp9086943	journal	April 2010
Atomic layer deposition of tungsten disulphide solid lubricant thin films Scharf, T. W.; Prasad, S. V.; Mayer, T. M. Journal of Materials Research, Vol. 19, Issue 12 https://doi.org/10.1557/JMR.2004.0459	journal	December 2004
Atomic Layer Deposition of Titanium Disulfide Thin Films Pore, V.; Ritala, M.; Leskelä, M. Chemical Vapor Deposition, Vol. 13, Issue 4 https://doi.org/10.1002/cvde.200606530	journal	April 2007
Atomic Layer Deposition of Lead Sulfide Thin Films for Quantum Confinement Dasgupta, Neil P.; Lee, Wonyoung; Prinz, Fritz B. Chemistry of Materials, Vol. 21, Issue 17 https://doi.org/10.1021/cm901228x	journal	August 2009
Atomic Layer Deposition of Tin Monosulfide Thin Films Sinsermsuksakul, Prasert; Heo, Jaeyeong; Noh, Wontae Advanced Energy Materials, Vol. 1, Issue 6, p. 1116-1125 https://doi.org/10.1002/aenm.201100330	journal	September 2011
Vapor-Phase Atomic-Controllable Growth of Amorphous Li ₂ S for High-Performance Lithium–Sulfur Batteries Meng, Xiangbo; Comstock, David J.; Fister, Timothy T. ACS Nano, Vol. 8, Issue 10 https://doi.org/10.1021/nn505480w	journal	October 2014
Vapor-Phase Atomic Layer Deposition of Co ₉ S ₈ and Its Application for Supercapacitors Li, Hao; Gao, Yuanhong; Shao, Youdong Nano Letters, Vol. 15, Issue 10 https://doi.org/10.1021/acs.nanolett.5b02508	journal	August 2015
Vapor-Phase Atomic Layer Deposition of Nickel Sulfide and Its Application for Efficient Oxygen-Evolution Electrocatalysis Li, Hao; Shao, Youdong; Su, Yantao Chemistry of Materials, Vol. 28, Issue 4 https://doi.org/10.1021/acs.chemmater.5b04645	journal	February 2016
Atomic Layer Deposited MoS 2 as a Carbon and Binder Free Anode in Li-ion Battery Nandi, Dip K.; Sen, Uttam K.; Choudhury, Devika Electrochimica Acta, Vol. 146 https://doi.org/10.1016/j.electacta.2014.09.077	journal	November 2014
Deposition of ultra thin CuInS ₂ absorber layers by ALD for thin film solar cells at low temperature (down to 150 °C) Schneider, Nathanaelle; Bouttemy, Muriel; Genevée, Pascal Nanotechnology, Vol. 26, Issue 5 https://doi.org/10.1088/0957-4484/26/5/054001	journal	January 2015
Atomic Layer Deposition of Li _x Al _y S Solid-State Electrolytes for Stabilizing Lithium-Metal Anodes Cao, Yanqiang; Meng, Xiangbo; Elam, Jeffrey W. ChemElectroChem, Vol. 3, Issue 6 https://doi.org/10.1002/celc.201600139	journal	April 2016
Electrochemical characteristics of aluminum sulfide for use in lithium secondary batteries Senoh, Hiroshi; Takeuchi, Tomonari; Kageyama, Hiroyuki Journal of Power Sources, Vol. 195, Issue 24 https://doi.org/10.1016/j.jpowsour.2010.06.079	journal	December 2010
Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition Elam, J. W.; Groner, M. D.; George, S. M. Review of Scientific Instruments, Vol. 73, Issue 8, p. 2981-2987 https://doi.org/10.1063/1.1490410	journal	August 2002
GaPO₄ Sensors for Gravimetric Monitoring during Atomic Layer Deposition at High Temperatures Elam, J. W.; Pellin, M. J. Analytical Chemistry, Vol. 77, Issue 11, p. 3531-3535 https://doi.org/10.1021/ac050349a	journal	June 2005
Indium Oxide ALD Using Cyclopentadienyl Indium and Mixtures of H ₂ O and O ₂ Elam, Jeffrey W.; Libera, Joseph A.; Hryn, John N. ECS Transactions, Vol. 41, Issue 2 https://doi.org/10.1149/1.3633663	journal	October 2011
Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles Ferguson, J. D.; Weimer, A. W.; George, S. M. Thin Solid Films, Vol. 371, Issue 1-2 https://doi.org/10.1016/S0040-6090(00)00973-1	journal	August 2000
Transmission infrared spectroscopy of high area solid surfaces. A useful method for sample preparation Ballinger, Todd H.; Wong, Jason C. S.; Yates, John T. Langmuir, Vol. 8, Issue 6 https://doi.org/10.1021/la00042a031	journal	June 1992
Infrared Studies of the Surface and Gas Phase Reactions Leading to the Growth of Titanium Nitride Thin Films from Tetrakis(dimethylamido)titanium and Ammonia Dubois, Lawrence H.; Zegarski, Bernard R.; Girolami, Gregory S. Journal of The Electrochemical Society, Vol. 139, Issue 12 https://doi.org/10.1149/1.2087327	journal	December 1992
Fourier transform infrared spectroscopy studies on thermal decomposition of tetrakis-dimethyl-amido zirconium for chemical vapor deposition of ZrN Kim, Ihl-Woo; Kim, Sung-Jae; Kim, Do-Heyoung Korean Journal of Chemical Engineering, Vol. 21, Issue 6 https://doi.org/10.1007/BF02719504	journal	December 2004
SiO ₂ Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy Burton, B. B.; Kang, S. W.; Rhee, S. W. The Journal of Physical Chemistry C, Vol. 113, Issue 19 https://doi.org/10.1021/jp806638e	journal	April 2009
Reactions of methylamines at the Si(100)-2×1 surface Mui, Collin; Wang, George T.; Bent, Stacey F. The Journal of Chemical Physics, Vol. 114, Issue 22 https://doi.org/10.1063/1.1370056	journal	June 2001
Chemistry of Diffusion Barrier Film Formation: Adsorption and Dissociation of Tetrakis(dimethylamino)titanium on Si(100)-2 × 1 Rodríguez-Reyes, Juan Carlos F.; Teplyakov, Andrew V. The Journal of Physical Chemistry C, Vol. 111, Issue 12 https://doi.org/10.1021/jp067929b	journal	March 2007
Infrared Spectroscopic Study of Decomposition of Ti(N(CH[sub 3])[sub 2])[sub 4] Driessen, Joost P. A. M.; Schoonman, Joop; Jensen, Klavs F. Journal of The Electrochemical Society, Vol. 148, Issue 3 https://doi.org/10.1149/1.1350687	journal	January 2001
Surface chemistry of precursors for film growth: pentakisdimethylamido tantalum Sloan, D. W.; Blass, P. M.; White, J. M. Applied Surface Science, Vol. 143, Issue 1-4 https://doi.org/10.1016/S0169-4332(98)00777-6	journal	April 1999
SH-Stretching Vibrational Spectra of Ethanethiol and tert- Butylthiol Miller, Benjamin J.; Howard, Daryl L.; Lane, Joseph R. The Journal of Physical Chemistry A, Vol. 113, Issue 26 https://doi.org/10.1021/jp9017162	journal	May 2009
Core electron binding energies in some Group IIIA, VB, and VIB compounds McGuire, G. E.; Schweitzer, G. K.; Carlson, Thomas A. Inorganic Chemistry, Vol. 12, Issue 10 https://doi.org/10.1021/ic50128a045	journal	October 1973
XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition Motamedi, P.; Cadien, K. Applied Surface Science, Vol. 315 https://doi.org/10.1016/j.apsusc.2014.07.105	journal	October 2014
Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al ₂ O ₃ -films Haeberle, Jörg; Henkel, Karsten; Gargouri, Hassan Beilstein Journal of Nanotechnology, Vol. 4 https://doi.org/10.3762/bjnano.4.83	journal	January 2013
Atomic layer deposition of ZnS via in situ production of H2S Bakke, J. R.; King, J. S.; Jung, H. J. Thin Solid Films, Vol. 518, Issue 19 https://doi.org/10.1016/j.tsf.2010.03.074	journal	July 2010
In Situ Transmission Electron Microscopy Observation of Pulverization of Aluminum Nanowires and Evolution of the Thin Surface Al ₂ O ₃ Layers during Lithiation–Delithiation Cycles Liu, Yang; Hudak, Nicholas S.; Huber, Dale L. Nano Letters, Vol. 11, Issue 10 https://doi.org/10.1021/nl202088h	journal	October 2011
Superior cycle stability of nitrogen-doped graphene nanosheets as anodes for lithium ion batteries Li, Xifei; Geng, Dongsheng; Zhang, Yong Electrochemistry Communications, Vol. 13, Issue 8, p. 822-825 https://doi.org/10.1016/j.elecom.2011.05.012	journal	August 2011
Formation and Growth of Surface Films on Graphitic Anode Materials for Li-Ion Batteries Gnanaraj, J. S.; Thompson, R. W.; Iaconatti, S. N. Electrochemical and Solid-State Letters, Vol. 8, Issue 2 https://doi.org/10.1149/1.1850390	journal	January 2005

Cited By (4)

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective Mäntymäki, Miia; Ritala, Mikko; Leskelä, Markku Coatings, Vol. 8, Issue 8 https://doi.org/10.3390/coatings8080277	journal	August 2018
Atomic layer deposition of ZnO/TiO2 nanolaminates as ultra-long life anode material for lithium-ion batteries Cao, Yan-Qiang; Wang, Shan-Shan; Liu, Chang Scientific Reports, Vol. 9, Issue 1 https://doi.org/10.1038/s41598-019-48088-2	journal	August 2019
Atomic layer deposited zinc oxysulfide anodes in Li-ion batteries: an efficient solution for electrochemical instability and low conductivity Sinha, Soumyadeep; Ramasamy, Hari Vignesh; Nandi, Dip K. Journal of Materials Chemistry A, Vol. 6, Issue 34 https://doi.org/10.1039/c8ta04129f	journal	January 2018
A revisit to atomic layer deposition of zinc oxide using diethylzinc and water as precursors Cai, Jiyu; Ma, Zhiyuan; Wejinya, Uche Journal of Materials Science, Vol. 54, Issue 7 https://doi.org/10.1007/s10853-018-03260-3	journal	December 2018

Similar Records

Atomic layer deposition of aluminum sulfide thin films using trimethylaluminum and hydrogen sulfide

Journal Article · Thu Jan 15 00:00:00 EST 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:1415984

Sinha, Soumyadeep; Mahuli, Neha

Atomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts

Journal Article · Mon Nov 07 00:00:00 EST 2016 · Langmuir · OSTI ID:1415984

Çimen, Yasemin; Peters, Aaron W.; Avila, Jason R.; +4 more

Atomic layer deposition of titanium sulfide and its application in extremely thin absorber solar cells

Journal Article · Thu Jan 15 00:00:00 EST 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:1415984

Mahuli, Neha

Related Subjects

36 MATERIALS SCIENCE
25 ENERGY STORAGE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Title: Atomic Layer Deposition of Aluminum Sulfide: Growth Mechanism and Electrochemical Evaluation in Lithium-Ion Batteries

Citation Formats

References (71)

Cited By (4)

Similar Records

Related Subjects