Plasma enhanced chemical vapor deposition of {open_quotes}diamond-like{close_quotes} carbon films from fluorinated feeds

Conference · Fri Dec 31 00:00:00 EST 1993

OSTI ID:141561

d`Agostino, R; Lamendola, R; Favia, P ^[1]

---

1. Universita di Bari (Italy)

Thin films have been deposited from 0-20% C{sub 2}F{sub 6}-H{sub 2} fed radiofrequency glow discharges in a triode reactor. Deposits contain carbon, hydrogen and fluorine in a variable extent. Structural analyses performed by means of Raman spectroscopy allow identification of the films obtained as {open_quotes}diamond-like{close_quotes} carbon. Actinometric Optical Emission Spectroscopy (AOES) has been utilized as a diagnostic tool of the plasma. A deposition mechanism is proposed, which involves carbon atoms and CH radicals as film precursors, and fluorine atoms at responsible for the material fluorination.

• OSTI ID: 141561
• Report Number(s): CONF-930304-; TRN: 93:003688-1241
• Resource Relation: Conference: 205. American Chemical Society national meeting, Denver, CO (United States), 28 Mar - 2 Apr 1993; Other Information: PBD: 1993; Related Information: Is Part Of 205th ACS national meeting; PB: 1951 p.
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON
CHEMICAL VAPOR DEPOSITION
CHEMICAL REACTION KINETICS
FLUORINE
HYDROGEN
GLOW DISCHARGES
THIN FILMS
DIAMONDS
RAMAN SPECTRA
CARBON FLUORIDES
PRECURSOR