Plasma enhanced chemical vapor deposition of {open_quotes}diamond-like{close_quotes} carbon films from fluorinated feeds
Conference
·
OSTI ID:141561
- Universita di Bari (Italy)
Thin films have been deposited from 0-20% C{sub 2}F{sub 6}-H{sub 2} fed radiofrequency glow discharges in a triode reactor. Deposits contain carbon, hydrogen and fluorine in a variable extent. Structural analyses performed by means of Raman spectroscopy allow identification of the films obtained as {open_quotes}diamond-like{close_quotes} carbon. Actinometric Optical Emission Spectroscopy (AOES) has been utilized as a diagnostic tool of the plasma. A deposition mechanism is proposed, which involves carbon atoms and CH radicals as film precursors, and fluorine atoms at responsible for the material fluorination.
- OSTI ID:
- 141561
- Report Number(s):
- CONF-930304--
- Country of Publication:
- United States
- Language:
- English
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