Plasma deposition of organic thin films: Control of film chemistry

Conference · Fri Dec 31 04:00:00 EST 1993

OSTI ID:141560

Ratner, B D ^[1]

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1. Univ. of Washington, Seattle, WA (United States)

Plasma deposition of thin, polymeric films represent a versatile surface modification technology. Although these thin films are exploited for many applications, complaints heard about plasma deposited films are that their structures are uncharacterizable, that organic functionality is lost in their production and that reproducibility is difficult. Recently, new methods for film production, reactor control and surface characterization have led to well characterized plasma deposited thin polymeric films (PDTPF) with defined structure and organic functionality. Such PDTPF often closely resemble conventionally prepared homopolymers. Methods that can be used to control the chemistry of PDTPF are the minimization of the plasma power, pulsing the RF field to reduce the {open_quotes}plasma on{close_quotes} time, use of a Faraday cage to reduce electron bombardment, positioning the sample downfield from the glow zone, the use of monomers containing polymerizable double bonds and the use of a cold substrate to condense vapor simultaneously with plasma deposition.

• OSTI ID: 141560
• Report Number(s): CONF-930304--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
CHEMICAL PROPERTIES
ENERGY DEPOSITION
ORGANIC POLYMERS
PLASMA HEATING
THIN FILMS