Molecular reactions at the film surface in plasma polymerization. [Plasma Polymerization]

Conference · Thu Jan 01 04:00:00 EST 1987

OSTI ID:6726831

Buss, R J

During the plasma polymerization process, the surface of the depositing material is continuously bombarded by a multitude of plasma generated species: ions, photons, radicals and other neutral molecules. In understanding the chemistry of the plasma polymerization process it is desirable to know the way in which these species interact with the film during deposition. Any individual molecule/surface collision may result in growth of the film by an attachment reaction, or in ablation by chemical or physical removal of previously attached atoms. Reported here are results of experiments designed to probe the reaction of molecules undergoing single collisions with the surface of a plasma-polymerized film during the deposition process. The method employed was a molecular beam sampling of all the plasma species and deposition of polymer from the beam onto a substrate. Control of the charged particle fluxes to the surface was used to study the role of ion bombardment. A beam of a probe molecule, incident on the film surface throughout the deposition, was used to investigate the interaction of the probe molecule with the surface. 6 refs., 3 figs.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 6726831
• Report Number(s): SAND-86-2471C; CONF-870410-4; CONF-870410-4; ON: DE87002488
• Country of Publication: United States
• Language: English

Related Subjects

656002* -- Condensed Matter Physics-- General Techniques in Condensed Matter-- (1987-)
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSORPTIVITY
CHEMICAL REACTIONS
DEPOSITION
FILMS
KINETICS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PLASMA
POLYMERIZATION
REACTION KINETICS
SURFACES
THIN FILMS