Effects of ion bombardment in plasma polymerization
Conference
·
OSTI ID:6102071
A molecular beam probe technique has been used to investigate the role of ion bombardment of the film surface during the plasma polymerication process. Thin films have been deposited in a vacuum chamber from a molecular beam containing all the plasma species and these were compared with similar deposits from a beam with the charged particles deflected away. A comparison was made of deposition rates, vis/uv and ir absorption spectra of the films. It was found that the deposition rate was increased 20% with the elimination of ion bombardment. Ions incident on the film surface during deposition cause a net ablation of the film. The ion bombardment also causes an increased absorption of uv and near-uv light by the film resulting in a noticeable yellowing. No change was observed in the ir spectra of the films with ion deflection. 7 refs., 3 figs.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6102071
- Report Number(s):
- SAND-85-2350C; CONF-860445-1; ON: DE86007702
- Country of Publication:
- United States
- Language:
- English
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