Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

Journal Article · Tue Mar 19 00:00:00 EDT 2013 · Nano Letters

DOI:https://doi.org/10.1021/nl304715p· OSTI ID:1382215

Manfrinato, Vitor R. ^[1]; Zhang, Lihua ^[2]; Su, Dong ^[2]; Duan, Huigao ^[3]; Hobbs, Richard G. ^[1]; Stach, Eric A. ^[2]; Berggren, Karl K. ^[1]

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1. Electrical Engineering and Computer Science Department, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
2. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
3. Micro−Nano Technologies Research Center, Hunan University, Changsha 410082, China

• Research Organization: Energy Frontier Research Centers (EFRC) (United States). Center for Excitonics (CE)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: SC0001088
• OSTI ID: 1382215
• Journal Information: Nano Letters, Vol. 13, Issue 4; Related Information: CE partners with Massachusetts Institute of Technology (lead); Brookhaven National Laboratory; Harvard University; ISSN 1530-6984
• Publisher: American Chemical Society
• Country of Publication: United States
• Language: English

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