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Title: Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

Journal Article · · Journal of Vacuum Science and Technology B
DOI:https://doi.org/10.1116/1.3456181· OSTI ID:1380396

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Light-Material Interactions in Energy Conversion (LMI)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
DOE Contract Number:
SC0001293
OSTI ID:
1380396
Journal Information:
Journal of Vacuum Science and Technology B, Vol. 28, Issue 4; Related Information: LMI partners with California Institute of Technology (lead); Harvard University; University of Illinois, Urbana-Champaign; Lawrence Berkeley National Laboratory; ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Country of Publication:
United States
Language:
English

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Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning journal January 2011
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